Conventional photolithography systems use physical masks which are expensive and difficult to create and cannot be used forever. Electron BeamDirectWrite (EBDW) lithography systems are a noteworthy alternative which do not need physical masks [Chokshi et al. (1999)]. As shown in Figure 1 they rely on an array of lithography writers to directly write a mask image on a photo-resist coated wafer u...

Nanoimprint lithography (NIL) has overcome the limitation of light diffraction. It is capable of printing features less than 10nm in size with high lithographic resolution, high manufacturing speed, and low production cost. The uniformity of pressure, however, remains a critical issue. To improve the uniformity of pressure, we developed a flexible uniform pressure component based on Pascal’s La...

Soft lithography is an alternative to silicon-based micromachining that uses replica molding of nontraditional elastomeric materials to fabricate stamps and microfluidic channels. We describe here an extension to the soft lithography paradigm, multilayer soft lithography, with which devices consisting of multiple layers may be fabricated from soft materials. We used this technique to build acti...

In the article technologies used in micro and nanoelectronics there are shortly described. Attention is devoted to lithography as a basic technology. Principles of electron and ion lithography are mentioned as well as progressive ion projection lithography. Some remarks to nanotubes as means of cold cathodes for vacuum electron tubes for nanoelectronics are presented.