This paper proposes a two-step radio frequency (RF) sputtering process to forma ZnO film for pyroelectric sensors. It is shown that the two-step sputtering process with alower power step followed by a higher power step can significantly improve the voltageresponsivity of the ZnO pyroelectric sensor. The improvement is attributed mainly to theformation of ZnO film with a strongly preferred orien...

In this paper, the RF power change effect on the structural, optical and electrical properties of CuO thin films prepared by RF reactive magnetron sputtering deposited on glass substrates are studied. At first, the thin films are prepared at 150, 280, 310 and 340W respectively. Then, the films are characterized by XRD, AFM, Uv-visible and four-point probe analysis respectively. The results show...

The absolute sputtering yields of D+, He+ and Li+ on deuterium saturated solid lithium have been measured and modelled at 45◦ incidence in the energy range 100–1000 eV. The Ion–surface InterAction Experiment (IIAX) was used to measure the absolute sputtering yield of lithium in the solid phase from bombardment with a Colutron ion source. The lithium sample was treated with a deuterium plasma fr...

Mixing dielectric materials in solid-thin-film deposition allows the engineering of thin films' optical constants to meet specific thin-film-device requirements, which can be significantly useful for optoelectronics devices and photonics technologies in general. In principle, by use of radio-frequency (rf) magnetron sputtering, it would be possible to mix any two, or more, materials at differen...