نتایج جستجو برای: sputtering

تعداد نتایج: 8003  

Journal: :journal of nanostructures 2013
p. balashabadi z. assadollahi m. ghasemi h. bakhtiari e. jafari-khamse

a cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. the substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. the al/ cu multilayer film was deposited on the glass substrate at the following conditions: working g...

2000
Emppu Salonen

A central issue in the performance of tokamak fusion devices is the choice of the plasma-facing materials. During the device operation the plasma-facing surfaces are subject to extreme heat and particle loads, as they are impinged on by escaped fusion plasma particles. Although carbon-based materials have excellent thermomechanical properties in view of the high heat flux, their use in the next...

2012
M. Mintas G. W. Filby

The effect of argon and oxygen sputtering on carbon contaminant buildup on ZnO during XPS (X-ray photoelectron spectroscopy) analysis has been examined. Argon and oxygen sputtering cause a rapid decline in hydroxyl oxygen and contaminant carbon content at the surface. Reduc­ tion to metallic zinc is not observed. In a carefully baked instrument after sputtering a stable clean surface could be m...

2008
Qiangmin Wei Kun-Dar Li Jie Lian Lumin Wang

An analytical formula is developed for the evolution of angular dependence of sputtering yields by extending the theory of sputtering yield proposed by Sigmund. We demonstrate that the peak of sputtering yield at oblique incidence can be attributed to a balance between the increased energy deposited on the surface by incident ion which enhances the sputtering yield and the decreased depth trave...

2013
T. A. Cassidy

We present the first calculation of Europa’s sputtering (ion erosion) rate as a function of position on Europa’s surface. We find a global sputtering rate of 2 10 H2O s , some of which leaves the surface in the form of O2 and H2. The calculated O2 production rate is 1 10 O2 s , H2 production is twice that value. The total sputtering rate (including all species) peaks at the trailing hemisphere ...

2003
D. J. Christie W. D. Sproul

Reactive co-sputtering is a means to create films of customized or graded index of refraction. This gives the optical coating designer new options, and enables practical realization of new classes of coatings. Two neighboring targets may be sputtered such that material from both targets and reactive gas are incident on the workpiece, depositing a film consisting of a compound. For example, if o...

2002
J. P. Allain D. N. Ruzic

The absolute sputtering yields of D+, He+ and Li+ on deuterium saturated solid lithium have been measured and modelled at 45◦ incidence in the energy range 100–1000 eV. The Ion–surface InterAction Experiment (IIAX) was used to measure the absolute sputtering yield of lithium in the solid phase from bombardment with a Colutron ion source. The lithium sample was treated with a deuterium plasma fr...

2008
R. E. Johnson M. Famá M. Liu

Icy grains and satellites orbiting in Saturn’s magnetosphere are immersed in a plasma that sputters their surfaces. This limits the lifetime of the E-ring grains and ejects neutrals that orbit Saturn until they are ionized and populate its magnetosphere. Here we reevaluate the sputtering rate of ice in Saturn’s inner magnetosphere using the recent Cassini data on the plasma ion density, tempera...

Journal: :Journal of nanoscience and nanotechnology 2008
D Paramanik S Majumdar S R Sahoo S N Sahu S Varma

We report formation of self organized InP nano dots using 3 keV Ar+ ion sputtering, at 15 degrees incidence from surface normal, on InP(111) surface. Morphology and optical properties of the sputtered surface, as a function of sputtering time, have been investigated by Scanning Probe Microscopy and Raman Scattering techniques. Uniform patterns of nano dots are observed for different durations o...

2008
Hans Hofsäss Kun Zhang

Sputter erosion of materials is among the most important techniques for fabricating advanced thin film coatings. Sputter processes are also of considerable relevance for surface polishing down to an atomic scale, nanostructuring of surfaces as dot and ripple patterns and micromachining of materials using focused ion beams or reactive ion etching. We present a new, versatile sputter technique ut...

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