Manufacturing intelligence for early warning of key equipment excursion for advanced equipment control in semiconductor manufacturing Chia-Yu Hsu, Chen-Fu Chien* and Pei-Nong Chen Department of Information Management, Yuan Ze University, 135 Yuan-Tung Road, Chungli 32003, Taiwan, Republic of China; Department of Industrial Engineering and Engineering Management, National Tsing Hua University, 1...

As microelectronics device feature sizes continue to shrink and wafers continue to increase in size, it is necessary to have tighter tolerances during the fabrication process to maintain high yields. Feedback control has, therefore, become an important issue in plasma processing equipment design. Comprehensive plasma equipment models linked to control algorithms would greatly aid in the investi...

The linear control of a nonlinear response is investigated in this paper, and model the system developed validated. design has been constrained based on suggested application, wherein mass expense are parameters to be kept minimum. Through these restrictions, array potential applications for widened. structure envisioned as robot manipulator link, utilises piezoelectric elements both sensors ac...

voltage control is one of the imperative issues in the smart distribution control system. while traditional distribution network is equipped with communication and monitoring equipment, the online voltage control can be perfectly achieved. with using these smart grid technologies, the distribution voltage control schemes should carry out intelligently and cover the undesirable effect of high pe...