2014 By means of a resistance thermometer structure diffused into the surface of a silicon wafer the temperature has been found to increase within a minute to over 100°C in a CF4 plasma. In contrast the system temperature rises only about 5 °C in the same time. This applies to a system in the tunnel configuration. In a parallel plate system the rise is far less steep and even within the usual e...

In MEMS fabrication micro-mechanical components have to be partially released from a substrate. Selectively etching away sacrificial layers, such that a free standing structure remains, is a widely used technique for this purpose. Free standing structures allow MEMS devices to induce or to sense mechanical movements or vibrations. During sacrificial etching lower etch rates than the blanket one...

INTRODUCTION The adhesive systems and the techniques currently used are designed to provide a more effective adhesion with reduction of the protocol application. The objective of this study was to evaluate the bond strength of universal adhesive systems on enamel in different etching modes (self-etch and total etch). MATERIALS AND METHODS The mesial and distal halves of 52 bovine incisors, he...

Real-time, in-situ control of reactive ion etching is shown to reduce loading disturbance in an Applied 8300 reactive ion etch system. The etch process vehicle is CF4 etching of polysilicon. A real-time, multivariable feedback control strategy where key plasma parameters are fed back has been developed. This strategy is experimentally compared with standard industry practice and is shown to red...

background: antioxidizing agents have recently been suggested to compensate decreased bond strength of resin materials to bleached tooth tissues. this study compared the shear bond strength (sbs) of three different adhesives on bleached dentin immediately after bleaching, bleached/delayed for 1 week, and bleached/applied antioxidizing agent. materials and methods: the dentinal surfaces of 132 i...

Uniformity and predictability are the principal qualities sought for all wet chemical etches. The establishment of these qualities, however, is hindered by a number of factom; such as nonuniformities in the starting material and random fluctuations in the local temperature and reactant concentration, which can lead to variations in etch rate across the surface of a wafer. The effects of variati...

OBJECTIVE To assess microleakage in conservative class V cavities prepared with aluminum-oxide air abrasion or turbine and restored with self-etching or etch-and-rinse adhesive systems. MATERIALS AND METHODS Forty premolars were randomly assigned to 4 groups (I and II: air abrasion; III and IV: turbine) and class V cavities were prepared on the buccal surfaces. Conditioning approaches were: g...

The purpose of this study was to investigate the effects of enamel pre-treatment with a new fluoride-containing casein phosphopeptide-amorphous calcium phosphate (CPP-ACP) complex on the shear bond strength (SBS) of brackets bonded with etch-and-rinse or self-etching adhesive systems. The material comprised 66 extracted human premolars randomly divided into six equal groups with respect to the ...

Titanium is a promising new material system for the bulk micromachining of microelectromechanical MEMS devices. Titaniumbased MEMS have the potential to be used for a number of applications, including those which require high fracture toughness or biocompatibility. The bulk titanium etch rate, TiO2 mask etch rate, and surface roughness in an inductively coupled plasma ICP as a function of vario...

MUMPs (Multi-User MEMS Process) based microchannels made of either glass or polysilicon have been successfully designed, fabricated and tested. The fabrication process used timed wet-chemical etching to selectively etch sacrificial materials with the assistance of etch holes. The prototype glass and polysilicon microchannels have cross-section areas of 70 m×4 m and 70 m×2 m, respectively, and b...