Keywords

In recent years, we have presented results on the development of erasable gratings in silicon to facilitate wafer scale testing of photonics circuits via ion implantation of germanium. Similar technology can be employed to develop a range of optical devices that are reported in this paper. Ion implantation into silicon causes radiation damage resulting in a refractive index increase, and can th...

Antimony tilt implantation has been utilized for source and drain extension formation of n-MOSFETs. The tilt implantation is a very convenient method to provide adequate overlap between the extensions and a gate electrode. MOSFET drive current was effectively improved by the tilt implantation without degrading short channel effects. key words: MOSFET, extension, gate, overlap, tilt implantation...

Nowadays, ion implantation is an extensively used technique for material modification. Using this method, we can tailor the properties of target materials, including morphological, mechanical, electronic, and optical properties. All of these modifications impel nanomaterials to be a more useful application to fabricate more high-performance nanomaterial-based devices. Ion implantation is an acc...

High-fluence N+-implantation in steel is monitored by use of nondestructive and contactless photothermal measurements during the implantation process. The modulated reflectivity is correlated with the results of Knoop hardness testing. On-line measurements on the steel surface and direct ion beam monitoring from the back side of a monitor sample are demonstrated. The maximum of the ion implanta...

A Novel Cellular Implantation System Using an Injectable Ultra-purified Alginate Gel for Arthroscopic Repair of Osteochondral Defects Tatsuya Igarashi1,2, Norimasa Iwasaki1,2, Yasuhiko Kasahara1,2, Akio Minami1,2 1Orthopaedic Surgery, Hokkaido University, Graduate School of Medicine, Sapporo, Japan; 2Frontier Research Center for Post-genomic Science and Technology, Hokkaido University, Sapporo,...