In this research, nanoimprint lithography (NIL) was used for patterning crystalline zinc oxide (ZnO) nanorods on the silicon substrate. To fabricate nano-patterned ZnO nanorods, patterning of an n-octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) on SiO2 substrate was prepared by the polymer mask using NI. The ZnO seed layer was selectively coated only on the hydrophilic SiO2 surf...

We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO(2) and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluid...

The hierarchically directed assembly of multiple types colloidal nano-objects on surfaces is interest for developing disruptive applications combining their original properties. We propose herein a versatile, electrostatically driven strategy to arrange various kinds colloids vertically in the shape 3D micropatterns by nanoxerography. made proof concept this vertical combinatorial nano-object p...

A new patterning method using Deoxyribose Nucleic Acid (DNA) strands capable of producing nanogaps of less than 100 nm is proposed and investigated in this work. DNA strands from Bosenbergia rotunda were used as the fundamental element in patterning DNA on thin films of aluminium (Al) metal without the need for any lithographic techniques. The DNA strands were applied in buffer solutions onto t...