.....................................................................................................I PREFACE.......................................................................................................III PAPERS INCLUDED IN THE THESIS ........................................................... V RELATED PUBLICATIONS NOT INCLUDED IN THE THESIS.................... VI ACKNOWLEDGEMENTS ...

in low-temperature chemical vapor deposition Navneet Kumar, Angel Yanguas-Gil, Scott R. Daly, Gregory S. Girolami, and John R. Abelson Department of Materials Science and Engineering, University of Illinois at Urbana Champaign, 1304 W. Green Street, Urbana, Illinois 61801, USA Department of Chemistry, University of Illinois at Urbana Champaign, 600 South Mathews Avenue, Urbana, Illinois 61801, USA

Silver containing nanocomposites receive increasing attention as antibacterial coatings. In this study we report on production of such materials using combination of gas aggregation sources of Ag nanoparticles and plasma enhanced chemical vapour deposition performed in HMDSO/O2 working gas mixtures. The main attention is devoted to the investigation of solubility of Ag nanoparticles in water in...

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

In this paper, we present and review recent developments in the high-density plasma chemical vapor deposition (HDP CVD) of silicon-based dielectric films, and of films of recent interest in the development of lower-dielectric-constant alternatives. Aspects relevant to the HDP CVD process and using the process to achieve interlevel insulation, gap filling, and planarization are discussed. Result...