We report a simple and mass-scalable approach for thin MoS2 films via RF sputtering combined with the post-deposition annealing process. We have prepared as-sputtered film using a MoS2 target in the sputtering system. The as-sputtered film was subjected to post-deposition annealing to improve crystalline quality at 700 °C in a sulfur and argon environment. The analysis confirmed the growth of c...

VOx thin films were deposited on Corning glass, fused silica and Ti foils by means of rf reactive sputtering from a metallic vanadium target. Argon-oxygen gas mixtures of different compositions controlled by the flow rates were used for sputtering. Influence of the oxygen partial pressure in the sputtering chamber on the structural and optical properties of thin films has been investigated. Str...

Bismuth titanate (Bi,Ti,O,, :BIT) thin films were prepared on the Pt courted MgO(100) substrate by electron cyclotron resonance plasma sputtering-chemical vapor deposition (ECR plasma sputtering-CVD). Bi20, was used as a sputtering target and tetra-isopropoxy-titanium [Ti(i-C3H70)4] as a CVD source. The composition of films was controlled by changing RF power (P,,) of Bi,O, target and Ti source...

We have studied electron emission, luminescence and sputtering from thin Ar ®lms excited by 2 MeV protons. We varied the voltage, Va, of the anode surrounding the target, which extracts electrons from the ®lm and results in unbalanced positive charges. The resulting large internal electric ®elds alter sputtering and luminescence. At the beginning of irradiation of a freshly deposited ®lm, we ob...

The growth of Eu-doped GaN (GaN:Eu) films has been performed on GaAs (100) substrates using RF magnetron sputtering method. The GaN layers exhibit a wurtzite structure. Substrate temperature and the pressure during the deposition do not influence the orientation of GaN:Eu films. After annealing of GaN films in NH3, a strong red luminescence at 622 nm due to Eu ions has been observed.

This contribution reviews plasma polymer nanoparticles produced by gas aggregation cluster sources either via plasma polymerization of volatile monomers or via radio frequency (RF) magnetron sputtering of conventional polymers. The formation of hydrocarbon, fluorocarbon, silicon- and nitrogen-containing plasma polymer nanoparticles as well as core@shell nanoparticles based on plasma polymers is...

A complete vector-2D micro-integrated sensors system for magnetic field measurement is proposed. The system consists of a micro-integrated Fluxgate magnetometer with front-end electronic circuitry based on second-harmonic detection. The magnetic core of the sensor is the VITROVAC 6025X deposited over the micro-integrated coils with the RF magnetron sputtering process deposition.

High-quality heteroepitaxial LaNiO3 (LNO) thin films were successfully grown on SrTiO3 (STO) substrates with RF-magnetron sputtering deposition at substrate temperatures in a range 150–650 ◦C. Azimuthal scans around the surface Bragg peak of the film and lattice images from a high-resolution transmission electron microscope (HRTEM) show that a well epitaxial relationship between film and substr...

A ZnO gas sensor was successfully prepared by RF sputtering. The maximum sensitivity of the sensor for vinegar test application was at 400oC. The ZnO based sensor showed good sensitivity for vinegar test in the concentration range of 4% to 9%. The work reveals the ability of using ZnO gas sensor to determine the acid concentrations of the vinegars for food requirements.