Transient reflectivity measurements using ultrashort pulse pump-probe techniques can provide very useful information on fast carrier dynamics in semiconductors. Several non-trivial problems encountered in measuring reflectivity changes have been described. These changes can be very small (ΔR/R ~10 or less) and hence measuring these small changes is not straightforward. The possible solutions in...

At room temperature, 300 K, silicon carbide film was formed using monomethylsilane gas on the reactive surface prepared using argon plasma. Entire process was performed at reduced pressure of 10 Pa in the argon plasma etcher, without a substrate transfer operation. By this process, the several-nanometer-thick amorphous thin film containing silicon-carbon bonds was obtained on various substrates...

As an extension of the authors' previous report of Ref 1, we describe an improved version of dispersive white-light interferometry that enables us to measure the tomographical thickness profile of a thin-film layer through Fourier-transform analysis of spectrally-resolved interference signals. The group refractive index can also be determined without prior knowledge of the geometrical thickness...

The metal-semiconductor interface in thin-film transistors (TFTs) is one of the bottlenecks on the development of these devices. Although this interface does not play an active role in the transistor operation, a low-quality interface can be responsible for a low performance operation. In a-Si TFTs, a doped film can be used to improve this interface, however, in other TFT technologies, there is...

Epitaxial m-plane ZnO thin films have been deposited on m-plane sapphire substrates at a low temperature of 200°C by atomic layer deposition. A 90° in-plane rotation is observed between the m-plane ZnO thin films and the sapphire substrates. Moreover, the residual strain along the ZnO [-12-10] direction is released. To fabricate metal-insulator-semiconductor devices, a 50-nm Al2O3 thin film is ...

In this work, nanostructured TiO2 and Cr-doped TiO2 thin films were deposited on glass substrate through sonochemical-chemical vapor deposition (CVD) method. The resulting thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-visible absorption spectroscopy, and photoluminescence spectroscopy techniques. The TiO2 thin film has nanocubic morphology and ...

Recent advances in thin-film crystal-g:rowth techniques such as molecular-beam epitaxy (MBE) have enabled the fabrication of quantum-well devices, which consist of alternating layers of various crystalline solid materials so thin that the materials' combined quantum-mechanical properties override their individual bulk properties. By using MBE, we constructed a number of quantum-well devices tha...

The presence of a deformation or hump in the subthreshold region of the transfer characteristic of Amorphous Oxide Semiconductor (AOS) Thin-Film Transistors (TFTs) has been observed after DC stress and related to different causes. In previous works, it has been shown that in devices with active-layer thickness greater than 120 nm, a region with relatively high conductivity remains near the back...

This report presents biotin-functionalized semiconducting polymers that are based on fluorene and bithiophene co-polymers (F8T2). Also presented is the application of these polymers to an organic thin film transistor used as a biosensor. The side chains of fluorene were partially biotinylated after the esterification of the biotin with corresponding alcohol-groups at the side chain in F8T2. The...

A fundamental strategy to enhance optical transmission through a continuous metallic film based on strong interference dominated by interface phase shift is developed. In a metallic film coated with a thin semiconductor film, both transmission and absorption are simultaneously enhanced as a result of dramatically reduced reflection. For a 50-nm-thick Ag film, experimental transmission enhanceme...