نتایج جستجو برای: capacitive behavior

تعداد نتایج: 625151  

Journal: :IEEE Trans. Instrumentation and Measurement 2002
Paul L. Fulmek Florian Wandling Wolfgang Zdiarsky Georg Brasseur Stefan P. Cermak

Based on a capacitive angle and angular rate sensor, a sensor measuring the relative angle between two rotating shafts has been developed. Two rotatable electrodes are placed between two sensor plates. The relative angle between the two rotors and the absolute position of the rotor blades are calculated from measurements of the capacitive coupling between different transmitting stator segments ...

Journal: :IEICE Transactions 2007
Yasuhiro Ogasahara Masanori Hashimoto Takao Onoye

Capacitive and inductive crosstalk noises are expected to be more serious in advanced technologies. However, capacitive and inductive crosstalk noises in the future have not been concurrently and sufficiently discussed quantitatively, though capacitive crosstalk noise has been intensively studied solely as a primary factor of interconnect delay variation. This paper quantitatively predicts the ...

1998
S. Nikolaidis A. Chatzigeorgiou

The resistive-capacitive behavior of long interconnects which are driven by CMOS gates is analyzed in this paper. The analysis is based on the π-model of an RC load and is developed for submicron devices. Accurate and analytical expressions for the output voltage waveform, the propagation delay and the short circuit power dissipation are derived by solving the system of differential equations w...

Journal: :Nano letters 2015
Qasim Mahmood Min Gyu Kim Sol Yun Seong-Min Bak Xiao-Qing Yang Hyeon Suk Shin Woo Sik Kim Paul V Braun Ho Seok Park

Two-dimensional (2D) heteronanosheets are currently the focus of intense study due to the unique properties that emerge from the interplay between two low-dimensional nanomaterials with different properties. However, the properties and new phenomena based on the two 2D heteronanosheets interacting in a 3D hierarchical architecture have yet to be explored. Here, we unveil the surface redox charg...

2011
K. G. Verma Brajesh Kumar Kaushik Raghuvir Singh

Process variation has recently emerged as a major concern in the design of circuits including interconnect in current nanometer regime. Process variation leads to uncertainties of circuit performances such as propagation delay. The performance of VLSI/ULSI chip is becoming less predictable as MOSFET channel dimensions shrinks to nanometer scale. The reduced predictability can be ascribed to poo...

Journal: :International Journal of Sensor Networks and Data Communications 2016

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