We present two simple methods, with parallel and serial gas flows, for the stacking of microfabricated silicon fuel cells with integrated current collectors, flow fields and gas diffusion layers. The gas diffusion layer is implemented using black silicon. In the two stacking methods proposed in this work, the fluidic apertures and gas flow topology are rotationally symmetric and enable us to st...

In this paper, a mathematical model is developed to calculate the conversion and the residence time reaction for plug flow and mixed flow in the reactors filled with cylin-drical particles using the shrinking core model. In this modeling, the size of the particles is un-chamged during the reaction. Also, the reaction rate is controlled by the gas layer resistance, the ash layer resistance, and ...

Gas diffusion layers (GDLs) are commonly known as one of the critical water management components in polymer electrolyte fuel cells with significant impact on electrochemical cell performance. Increasing levels liquid saturation GDLs, especially during high-current-density operation, limit gas transport from flow field channels to catalyst layer surfaces and hence reduce To provide GDL material...

The primary removal of product water in proton exchange membrane (PEM) fuel cells is through the cathode gas diffusion layer (GDL) which necessitates the understanding of vapor and liquid transport of water through porous media. In this investigation, the effect of microporous layer (MPL) coatings, GDL thickness, and polytetrafluorethylene (PTFE) loading on the effective water vapor diffusion c...

An experimental setup to determine thermal conductivity and thickness of a gas diffusion layer (GDL) as a function of compression was developed and calibrated. The actual thermal conductivities, based on compressed thickness, of plain Toray TGP-H gas diffusion layer (GDL) at compression pressures of 0.04 to 1.5 MPa and over temperature range of 25 C to 75 C are reported in this paper. The therm...

The sensitivity of the LR 115 detector inside a diffusion chamber to (220)Rn gas concentration is dependent on the removed active layer thickness during chemical etching. This dependence is related to the V function for the LR 115 detector (where V is the ratio between the track etch velocity V(t) and the bulk etch velocity V(b)) and the geometry of the diffusion chamber. The present paper pres...