This study reports the chemical vapor deposition of amorphous boron carbonitride films on Si(100) and SiO2 substrates using a trimethylamine borane nitrogen mixture. BCxNy with different compositions were produced via variations in substrate temperature type gas-phase activation. The low-pressure (LPCVD) plasma-enhanced (PECVD) methods used. “elemental composition—chemical bonding state—propert...

2 A process to fabricate functional polysilicon structures above large (43 4 mm ) thin (200 nm), very flat LPCVD silicon rich nitride membranes was developed. Key features of this fabrication process are the use of low-stress LPCVD silicon nitride, sacrificial layer etching, and minimization of membrane stress and deformation after fabrication, which was done by complete removal of the sacrific...

This study reports the mechanical response of distinct carbon nanotube (CNT) morphologies as revealed by flat punch in situ nanoindentation in a scanning electron microscope. We find that the location of incipient deformation varies significantly by changing the CNT growth parameters. The initial buckles formed close to the growth substrate in 70 and 190 μm tall CNT forests grown with low press...

P-Type polycrystalline silicon-germanium (SiGe) thin films are grown by low-pressure chemical vapor deposition (LPCVD) and their thermoelectric properties are characterized from 120 K to 300 K for potential application in integrated microscale cooling. The naturally formed grain boundaries are found to play a crucial role in determining both the charge and thermal transport properties of the fi...

A monolithic CMOS microhotplate-based conductance-type gas sensor system is described. A bulk micromachining technique is used to create suspended microhotplate structures that serve as sensing film platforms. The thermal properties of the microhotplates include a 1-ms thermal time constant and a 10 C mW thermal efficiency. The polysilicon used for the microhotplate heater exhibits a temperatur...