ZnO films were coated on the order of micrometer thickness on various substrates using RF magnetron sputtering. Glass, mica and Si were used as amorphous and crystalline substrates to study film growth. X-ray diffraction measurements revealed a self-induced, (002) oriented texture on all substrates. Effects of residual stresses on growth behavior and possible mechanisms of textured crystallizat...

Coating growth and mechanical properties of nanolamellar Cr2AlC coatings at various sputtering power were investigated in the present study. Cr2AlC coating was deposited on the IN 718 superalloy and (100) Si wafers by DC magnetron sputtering at different sputtering powers. The structure and properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmis...

copper films of 300 nm thickness deposited by planar magnetron sputtering on glass substrates, for substrate temperatures between 300 and 500 k, and deposition rate of 10 ?s?1. microstructure of these films was obtained by x-ray diffraction, while the texture mode of diffractometer was used for stress measurement by the sin2? technique. the components of the stress tensor are obtained using mea...

J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson, High power impulse magnetron sputtering discharge, 2012, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, (30), 030801. http://dx.doi.org/10.1116/1.3691832 Copyright: American Vacuum Society, This article may be downloaded for personal use only. Any other use requires prior permission of the author and the ...

Zn depletion by energetic negative oxygen ion re-sputtering is one of the main factors influencing optoelectronic properties aluminum doped zinc oxide thin films deposited RF magnetron sputtering.

Morphology evolution of the multicomponent metallic glass film obtained by radio frequency (RF) magnetron sputtering was investigated in the present work. Two modes of metallic glass sputtering were distinguished: smooth film mode and clustered film mode. The sputtering parameters, which have the most influence on the sputtering modes, were determined. As a result, amorphous Ni-Nb thin films wi...

A series of Co/Pd multilayers were made by dc magnetron sputter deposition on Al foil substrates. For these multilayered samples, Co layer thicknesses were less than 4 A and Pd layers were varied from 4 to 22 A. Sputtering rates were controlled by either sputtering power (10-50 W) or Ar sputtering pressure (3-15 mTorr). In both cases, lower deposition rates yielded higher perpendicular coercivi...