نتایج جستجو برای: phase change

تعداد نتایج: 1154431  

Journal: :Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics 2000
Heiss

Level repulsion is associated with exceptional points which are square root singularities of the energies as functions of a (complex) interaction parameter. This is also valid for resonance state energies. Using this concept it is argued that level anticrossing (crossing) must imply crossing (anticrossing) of the corresponding widths of the resonance states. Further, it is shown that an encircl...

Journal: :Physical review letters 2017
M Först K R Beyerlein R Mankowsky W Hu G Mattoni S Catalano M Gibert O Yefanov J N Clark A Frano J M Glownia M Chollet H Lemke B Moser S P Collins S S Dhesi A D Caviglia J-M Triscone A Cavalleri

Selective optical excitation of a substrate lattice can drive phase changes across heterointerfaces. This phenomenon is a nonequilibrium analogue of static strain control in heterostructures and may lead to new applications in optically controlled phase change devices. Here, we make use of time-resolved nonresonant and resonant x-ray diffraction to clarify the underlying physics and to separate...

2007
Der-Sheng Chao Yan-Kai Chen Yi-Bo Liao Meng-Hsueh Chiang Chenhsin Lien Ming-Jer Kao Ming-Jinn Tsai

Journal: :The Journal of chemical physics 2016
David A Nicholson Gregory C Rutledge

We introduce a method for the analysis of nucleation using mean first-passage time (MFPT) statistics obtained by molecular dynamics simulation. The method is based on the Becker-Döring model for the dynamics of a nucleation-mediated phase change and rigorously accounts for the system size dependence of first-passage statistics. It is thus suitable for the analysis of systems in which the separa...

Journal: :Optics express 2008
B Deutsch R Hillenbrand L Novotny

Scattering-type scanning near-field optical microscopy has allowed for investigation of light-matter interaction of a large variety of samples with excellent spatial resolution. Light incident on a metallic probe experiences an amplitude and phase change on scattering, which is dependent on optical sample properties. We implement phase-shifting interferometry to extract amplitude and phase info...

2013
Wen-Pin Hsieh Peter Zalden Matthias Wuttig Aaron M. Lindenberg Wendy L. Mao

Journal: :Optics express 2010
Shashidhara Marathe S S Kim S N Kim Chan Kim H C Kang P V Nickles D Y Noh

We present a reflection based coherent diffraction imaging method which can be used to reconstruct a non periodic surface image from a diffraction amplitude measured in reflection geometry. Using a He-Ne laser, we demonstrated that a surface image can be reconstructed solely from the reflected intensity from a surface without relying on any prior knowledge of the sample object or the object sup...

Journal: :Nanoscale 2016
C Frankiewicz D Attinger

Superhydrophobic surfaces with the self-cleaning behavior of lotus leaves are sought for drag reduction and phase change heat transfer applications. These superrepellent surfaces have traditionally been fabricated by random or deterministic texturing of a hydrophobic material. Recently, superrepellent surfaces have also been made from hydrophilic materials, by deterministic texturing using phot...

Journal: :Optics express 2010
Martin Persson David Engström Anders Frank Jan Backsten Jörgen Bengtsson Mattias Goksör

We present a method for reducing intensity fluctuations that typically occur when a spatial light modulator is updated between consecutive computer generated holograms. The method is applicable to most iterative hologram generating algorithms and minimizes the average phase difference between consecutive holograms. Applications with high stability requirements, such as optical force measurement...

2014
Bi Jian Zeng Jun Zhu Huang Ri Wen Ni Nian Nian Yu Wei Wei Yang Zhi Hu Zhen Li Xiang Shui Miao

Currently, the most widely used photoresists in optical lithography are organic-based resists. The major limitations of such resists include the photon accumulation severely affects the quality of photolithography patterns and the size of the pattern is constrained by the diffraction limit. Phase-change lithography, which uses semiconductor-based resists such as chalcogenide Ge₂Sb₂Te₅ films, wa...

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