A new type of photomask was fabricated by casting a prepolymer of a transparent, elastomeric polymer ~polydimethylsiloxane, PDMS! against a Si~100! master whose surface has been patterned with V-shaped trenches or pyramidal pits using anisotropic etching. The PDMS replica, when placed in contact with a film of photoresist and illuminated, acts as a photomask. The sidewalls of the trenches and p...

The use of SU-8 as precursor for glass-like carbon, or glassy carbon, is presented here. SU-8 carbonizes when subject to high temperature under inert atmosphere. Although epoxy-based precursors can be patterned in a variety of ways, photolithography is chosen due to its resolution and reproducibility. Here, a number of improvements to traditional photolithography are introduced to increase the ...

In the first part of present article, important and main methods photolithography are reviewed discussed. Then we introduce ways to improve images created on photoresist, which is material lithography. Lithography with high-energy particle soft lithography then described. second part, contact-photolithography method its improvement process, use in our laboratory, introduced described detail. We...

Microfabrication is commonly achieved via interactions of light and a photoresist (an optically sensitive material). In this process, the light is shaped into the desired pattern by a mask and projected onto the photoresist. The entire photoresist sample is then submerged within a developer, which dissolves the exposed photoresist and leaves the unexposed photoresist intact. Mask patterns can t...

The production of sub-10 µm cellulose microbeads via membrane emulsification using isoporous membranes is reported here for the first time. Poly(ethylene terephthalate) membranes, with defined interpore distances, pore diameters and straight-through pores were fabricated photolithography. A dispersed phase 8 wt% solution was extruded through pores, forming, due to shear provided by an overhead ...