Nanocomposite materials containing metal nanoparticles are of considerable interest in photonics and optoelectronics applications. However, device fabrication of such materials always encounters the challenge of incorporation of preformed nanoparticles into photoresist materials. As a solution to this problem, an easy new method of fabricating silver nanocomposites by an in situ reduction of pr...

The electron-induced fragmentation mechanisms of two important EUV-photoresist monomers methyl isobutyrate and methacrylic acid are investigated in the film gas-phases.

Stimuli-responsive hydrogels have attracted much attention owing to the versatility of their programmed response in offering intelligent solutions for biomimicry applications, such as soft robotics, tissue engineering, and drug delivery. To achieve complexity biomimetic structures, two photon polymerization (2PP) has provided a means fabricating intricate 3D structures from stimuli-responsive h...

Laser microlens array (MLA) lithography was used to fabricate arbitrary periodic array of patterns on photoresist. Reactive ion etching (RIE) was then utilized to etch and transfer the patterns down to the fused silica substrate. By controlling the etching process, the etched surface was 180° out of phase with the unetched surface. Subsequently, the patterns were used as a phase shift mask for ...

Spot size reduction is demonstrated by printing focused spots from amplitude-modulated radially polarized light at the wavelength λ = 405 nm on a photoresist. Amplitude modulation is realized by ring illumination and by application of an optimized amplitude distribution function. Amplitude modulation is implemented via spatial light modulator, which is followed by a specially designed radial wi...

A rigorous three-dimensional (3-D) simulation method for photoresist exposure and development is presented in which light scattering due to a nonplanar topography is calculated using the Maxwell equations. The method relies on a Fourier expansion of the electromagnetic field and extends the two-dimensional (2-D) differential method [1], [2] to the third dimension. The model accounts for partial...

We present an optical interference model to create chiral microstructures (spirals) and its realization in photoresist using holographic lithography. The model is based on the interference of six equally-spaced circumpolar linear polarized side beams and a circular polarized central beam. The pitch and separation of the spirals can be varied by changing the angle between the side beams and the ...

We demonstrate that the use of a single SiO2 film, with thickness corresponding to one standing wave (SW) period allows the recording of deep photoresist structures on silicon substrates by laser interference, without use of any additional antireflecting coating. This condition corresponds just to the opposite thickness (half SW period) previously proposed for using the SiO2 films for phase-shi...

This paper presents the fabrication technology of microlenses maintaining a high reproducibility of their characteristics with low cost. The objective of microlenses is to be integrated into imagers in CMOS technology to allow stereoscopic vision. The fabricated microlenses form cylindrical arrays to be placed above the optical filters and photodetectors, in order to potentiate stereoscopic vis...

We demonstrate a laser-based technique to directly synthesize few layer graphene on quartz substrates without using any metal catalyst. In our approach, a photoresist S-1805 (from Shipley Comp.) film coated on quartz wafers was heated, and then decomposed, by irradiation of a continuous-wave laser. The carbon atoms from the photoresist were dissolved in the molten quartz, and then extracted to ...