نتایج جستجو برای: scanning probe lithography
تعداد نتایج: 252209 فیلتر نتایج به سال:
This paper is an overview of work in the IBM Microelectronics Division to extend electronbeam lithography technology to the projection level for use in next-generation lithography. The approach being explored—Projection Reduction Exposure with Variable Axis Immersion Lenses (PREVAIL)—combines the high exposure efficiency of massively parallel pixel projection with scanning-probe-forming systems...
This article introduces a scanning probe lithography technique in which ultracompliant thermal probes are used in the selective thermochemical patterning of commercially available photoresist. The micromachined single-probe and multiprobe arrays include a thin-film metal resistive heater and sensor sandwiched between two layers of polyimide. The low spring constant s,0.1 N/md and high thermal i...
C arbon nanomaterials such as carbon nanotubes 1 and graphene 2 are low-dimensional materials that can have defect-free lattices over microscopic length scales, which is a feature that only a few other nanomaterials can offer. Despite the excitement that these materials have generated in the condensed-matter physics community due to their potential as playgrounds for quantum transport study, th...
In article number 2008662, Elisa Riedo, Giuseppe Maria de Peppo, and co-workers describe a novel thermochemi cal scanning probe lithography (tSPL)-based platform for the low-cost high throughput fabrication of bone tissue replicas in biocompatible material with nanoscale resolution. The bio-tSPL creates unique opportunities understanding cell-tissue microenvironment interactions applications re...
Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening tec...
This thesis is concerned with the use of the scanning near-field optical microscope (SNOM) to pattern and image conjugated polymer structures. The SNOM is one of just a few optical instruments which are capable of breaking the diffraction limit which limits conventional microscopes to a resolution of approximately half a wavelength. It does so by directing light onto a sub-wavelength aperture a...
We propose a scheme of overlay alignment for plasmonic lithography using a scanning contact probe. Using two resonances of a ridge aperture in a metal film, we introduce the aperture's multifunctional characteristics for patterning and alignment at different wavelengths. To verify this idea, we measure an image of an alignment mark using a scanning ridge aperture and determine the reference poi...
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