نتایج جستجو برای: tantalum nitride

تعداد نتایج: 16947  

2015
QIAN WANG HUI ZHANG QIJIA LI LEI YE HONGQUAN GAN YINGJIE LIU HUI WANG ZHIQIANG WANG

Porous tantalum has been reported to be a promising material for use in bone tissue engineering. In the present study, the biocompatibility and osteogenic properties of porous tantalum were studied in vitro and in vivo. The morphology of porous tantalum was observed using scanning electron microscopy (SEM). Osteoblasts were cultured with porous tantalum, and cell morphology, adhesion and prolif...

Journal: :Physical chemistry chemical physics : PCCP 2015
Ahmed Ziani Ela Nurlaela Dattatray S Dhawale Diego Alves Silva Erkki Alarousu Omar F Mohammed Kazuhiro Takanabe

The physicochemical properties of a tantalum nitride (Ta3N5) photoanode were investigated in detail to understand the fundamental aspects associated with the photoelectrochemical (PEC) water oxidation. The Ta3N5 thin films were synthesized using DC magnetron sputtering followed by annealing in air and nitridation under ammonia (NH3). A polycrystalline structure with a dense morphology of the mo...

2017
Yuh-Chen Lin Felicia McGuire Aaron D. Franklin

Hafnium zirconium oxide (Hf0.5Zr0.5O2 or HZO) thin films show great promise for enabling ferroelectric field-effect transistors (FeFETs) for memory applications and negative capacitance FETs for low-power digital devices. One challenge in the integration of ferroelectric HZO is the need for specific capping layers to yield the most pronounced ferroelectric behavior; to date, superior HZO device...

2015
YiChao Yan Wei Shi HongChuan Jiang XianYao Cai XinWu Deng Jie Xiong WanLi Zhang

The energetic igniters through integrating B/Ti nano-multilayers on tantalum nitride (TaN) ignition bridge are designed and fabricated. The X-ray diffraction (XRD) and temperature coefficient of resistance (TCR) results show that nitrogen content has a great influence on the crystalline structure and TCR. TaN films under nitrogen ratio of 0.99 % exhibit a near-zero TCR value of approximately 10...

2013
Young-Jun Lee Dae-Young Kim Kap-Ho Lee Moon-Hee Han Kyoung-Soo Kang Ki-Kwang Bae Jong-Hyeon Lee

Cubic delta-tantalum nitride (δ-TaN) nanoparticles were selectively prepared using a K2TaF7 + (5 + k) NaN3 + kNH4F reactive mixture (k being the number of moles of NH4F) via a combustion process under a nitrogen pressure of 2.0 MPa. The combustion temperature, when plotted as a function of the number of moles of NH4F used, was in the range of 850°C to 1,170°C. X-ray diffraction patterns reveale...

Journal: :Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 2013

Journal: :Coatings 2022

In the present work electrochemical deposition of hydroxyapatite using simulated body fluid (SBF) as an electrolytic medium was carried out on Ta and Ta/TaN coatings BIOLINE stainless steel SS316LVM (SS). The performed each substrate for 3000 6000 s, at different potentials were determined from cyclic voltammetry. best conditions found −1.4 V bare SS −1.7 coating. structural characterization by...

Journal: :Nucleation and Atmospheric Aerosols 2021

Thin films based on aluminum nitride were obtained by fs-laser assisted Pulsed Laser Deposition (fs-PLD) at room temperature tantalum substrates for studying the electron emission performance in range 700- 1600 °C, so to investigate possibility of their exploitation as thermionic cathodes. Results structural, chemical and morphological analyses show growth nanostructured thin with a significant...

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