نتایج جستجو برای: برانبارش cmp

تعداد نتایج: 2561  

هدف این پژوهش، تعیین اثر خمیر OMG مرکب‌زدایی‌شده در خمیرکاغذ CMP صنوبر دلتوئیدس بر ویژگی‌های کاغذهای به‌دست آمده و تعیین مناسب‌ترین درصد اختلاط خمیرکاغذ OMG مرکب‌زدایی شده با خمیر CMP صنوبر دلتوئیدس است. نمونه‌های صنوبر دلتوئیدس از جنگل تحقیقاتی دکتر بهرام‌نیا واقع در منطقه شصت‌کلا گرگان تهیه و با استفاده از سولفیت سدیم و کربنات سدیم پخته و به خمیر CMP تبدیل شد. سپس به‌منظور رسیدن به درجه روانی...

Journal: :Molecular pharmacology 2005
Chih-Hung Hsu Jieh-Yuan Liou Ginger E Dutschman Yung-Chi Cheng

Human UMP/CMP kinase (cytidylate kinase; EC 2.7.4.14) is responsible for phosphorylation of CMP, UMP, and deoxycytidine monophosphate (dCMP) and also plays an important role in the activation of pyrimidine analogs, some of which are clinically useful anticancer or antiviral drugs. Previous kinetic data using recombinant or highly purified human UMP/CMP kinase showed that dCMP, as well as pyrimi...

Journal: :Neurologie pro praxi 2022

SpĂĄnkovĂŠ poruchy dĂ˝chania predstavujĂş vĂ˝znamnĂ˝ rizikovĂ˝ faktor cerebrovaskulĂĄrnych ochorenĂ­. SyndrĂłm spĂĄnkovĂŠho apnoe (SAS) je u pacientov s cievnou mozgovou prĂ­hodou (CMP) častĂ˝ a nepriaznivo ovplyvňuje ich zdravotnĂ˝ stav. Napriek tomu ostĂĄva veÄžkĂĄ časĹĽ CMP po tejto strĂĄnke nediagnostikovanĂ˝ch prichĂĄdza o potenciĂĄlny benefit pretlakovej ventilačnej liečby. V tomto Ä...

Journal: :International Journal of Precision Engineering and Manufacturing-Green Technology 2021

Chemical mechanical polishing (CMP) is an essential planarization process for semiconductor manufacturing. The application of CMP has been increasing in fabrication highly integrated devices. Recently, environmental burden caused by the was assessed because interest global environment. In this study, previously reported impacts on environment and studies conducted developing various methods to ...

Journal: :Molecular pharmacology 1999
A R Van Rompay M Johansson A Karlsson

Phosphorylation of deoxycytidine analogs by cellular enzymes is a prerequisite for the activity of these compounds. We have investigated the kinetic parameters for the phosphorylation of 1-beta-D-arabinofuranosylcytosine (araC) and 2', 2'-difluorodeoxycytidine (dFdC) to their diphosphate forms catalyzed by human UMP-CMP kinase. We cloned the cDNA of this enzyme to enable characterization of the...

ژورنال: فیزیک زمین و فضا 2013
مهرداد سلیمانی منفرد هاشم شاهسونی یورگن مان

شرایط زمین‌شناسی در منطقه گرابن بزرگ راین در منطقه مرزی بین فرانسه و آلمان به گونه­ایی است که برای بهره‌برداری‌‌های زمین‌گرمایی مناسب به نظر می­رسد. در این تحقیق، داده­های لرزه‌نگاری بازتابی برداشت شده، به روش‌‌های نوین مورد پردازش قرار گرفت. در این تحقیق، علاوه بر چندین مقطع زمانی برانبارش که به روش‌‌های مرسوم، روش سطح بازتاب مشترک و روش سطح پراش مشترک تهیه شد، مدل سرعت منطقه نیز به روش توموگر...

Journal: :Cancer research 2002
Jieh-Yuan Liou Ginger E Dutschman Wing Lam Zaoli Jiang Yung-Chi Cheng

Pyrimidine nucleoside monophosphate kinase [UMP/CMP kinase (UMP/CMPK);EC 2.7.4.14] plays a crucial role in the formation of UDP, CDP, and dCDP, which are required for cellular nucleic acid synthesis. Several cytidine and deoxycytidine analogues are important anticancer and antiviral drugs. These drugs require stepwise phosphorylation to their triphosphate forms to exert their therapeutic effect...

Journal: :ECS Journal of Solid State Science and Technology 2022

As a crucial substrate material for optoelectronic materials, sapphire has important applications in both military and civilian fields. In order to achieve the final processing quality of double-sided chemical mechanical polishing (DS-CMP) is necessary process, which also guarantee preparation high-end LED chips. this article, DS-CMP plan based on Box-Behnken design obtained experimented. Then,...

2011
David W. Embley Stephen W. Liddle Oscar Pastor

In order to promote Conceptual-Model Programming (CMP), we set forth these CMP Articles. We hold these articles to be the defining principles for model-complete software development. In essence, this CMP manifesto asserts that programming activities are to be carried out via conceptual modeling. For applications amenable to conceptual-model designs, software developers should never need to writ...

Journal: :Applied sciences 2021

Chemical–mechanical polishing (CMP) is a process that planarizes semiconductor surfaces and essential for the manufacture of highly integrated devices. In CMP, pad conditioning using disk with diamond grit adopted to maintain surface roughness remove debris. However, uneven wear by unavoidable in CMP. this study, we propose contact-area-changeable system utilize it conduct preliminary study imp...

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