a new method is developed for a fast identification of the stability situation of industrial processes. the proposed method includes two factor ratios of the control constants for the upper and lower control limits to process these constants. an indication ratio is then defined as the ratio of the maximum data range value to the difference between the maximum and average values for individual d...

the classical method of process capability analysis necessarily assumes that collected data are independent; nonetheless, some processes such as biological and chemical processes are autocorrelated and violate the independency assumption. many processes exhibit a certain degree of correlation and can be treated by autoregressive models among which the autoregressive model of order one (ar (1)) ...

As chemical engineering education moves into the new millennium, it is incumbent on educators to provide a modern curriculum for process design, yet mindful of the limited time for instruction that is available. This paper addresses three key components of a chemical engineering curriculum that prepare undergraduates to be effective process designers in industry: (a) a structured approach relyi...

High quality mechanical manufacturing of small components and subassemblies having geometric features in the micrometer range requires controlled and coordinated processes. Considering full automation of the production process as essential, not only manufacturing processes have to be optimized but also handling and quality assurance operations take an integral part of the production process. We...

Many eLearning approaches tend to separate learning activities from everyday work. This working paper presents a case study where closer integration between learning and work was achieved by rather simple means. The case study points out significant opportunities for enriched integration, benefiting course design, organisational knowledge management, and information system customisation. We the...

We summarize two approaches to integrated multiscale process simulation (IMPS), particularly relevant to integrated circuit (IC) fabrication, in which models for equipment (m) and feature (lm) scales are solved simultaneously. The first approach uses regular grids, and is applied to low-pressure chemical vapor deposition (LPCVD) of silicon dioxide from tetraethoxysilane (TEOS). The second appro...