Copper thin films with nano-scale structure have numerous applications in modern technology.  In this work, Cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by DC magnetron sputtering technique at room temperature in pure Ar gas. The sputtering time was considered in 4, 8, 12 and 16 min, respectively. The thickness effect on the structural, mo...

Of crucial importance to the thin film process engineer is an understanding of the parameters which affect the film thickness distributions which may be obtained from magnetron sources. This paper describes how variations in source design, target erosion and source-to-substrate distance affect observed uniformities from a magnetron source. A simple method of simulating magnetron sources using t...

We have investigated the effects of sputtering Ar gas pressure on magnetic and magneto-optical properties in compositionally modulated Co/Pd thin films. The samples were prepared by dc magnetron sputtering from 2-in.-diam Co and Pd targets by alternately exposing the substrates to targets. Sputtering Ar gas pressure was varied from 2 to 30 mTorr. All samples had same bilayer thicknesses compose...

Titanium dioxide (titania) is widely used as a photocatalyst for its moderate band gap, high photoactivity, recyclability, nontoxicity, low cost and its significant chemical stability. The anatase phase of titania is known to show the highest photocatalytic activity, however, the presence of this phase alone is not sufficient for sustained activity. In this study TiO2 coatings were deposited on...

In this study, the effect on thin film growth due to an anomalous electron transport, found in high power impulse magnetron sputtering (HiPIMS) has been investigated for the case of a planar circular magnetron. An important consequence of this type of transport is that it affects the way ions are being transported in the plasma. It was found that a significant fraction of ions are transported r...

A two-compartment Plexiglas cell has been set up and tested for separate hydrogen and oxygen production from photocatalytic water splitting on a thin TiO2 layer deposited by magnetron sputtering on a flat Ti electrode inserted between the two cell compartments.

The Target Group has recently begun to apply ion beam sputter deposition for target pusher layer fabrication. Metal deposition on both levitated and stalk-mounted fusion targets has been demonstrated. We believe this is the first application of this versatile deposition technique to IF target pusher layerfabrication. Our initial results indicate that ion beam sputtering is far more controllable...

Abstrad: Recent developments in the techniques used to produce surface layers of oxides and nitrides by reactive sputtering are considered. These techniques have to give films which can be produced onto large-area, low-temperature substrate materials, such as glass and polymer. It is shown that this has led to the adoption of ion-assisted processes. In particular the use of plasmas leaked from ...

Conditions for depositing perovskite-oriented Pb0.92Sr0.08(Zr0.65Ti0.35) O3 thin films on gold by RF magnetron sputtering are investigated. Deposition results were analysed by scanning electron microscopy, X-ray photoelectron spectroscopy and X-ray diffractometry. It was found that the desired perovskite phase can be obtained at a substrate temperature of 300 C, much lower than the typically re...

In this work, a nanolayer of titanium nitride which produced by the magnetron sputtering system is synthesized. Moreover the effect of plasma parameters on the electron temperature is studied. Electron temperature has a significant effect on the plasma coating system properties. The results show that, increasing the working pressure and nitrogen ratio in the system causes decreasing electron te...