نتایج جستجو برای: pecvd reactor
تعداد نتایج: 30231 فیلتر نتایج به سال:
Zirconia layers are often used as thermal barriers. In recent years, depositions by chemical vapor deposition methods using a metalorganic precursor (MOCVD) have been primarily investigated. Here, we combine MOCVD with plasma activation - plasma-enhanced (PECVD]) of the gas phase and/or growth surface to lower temperature and allow for flexible coating design. PECVD causes be transformed into c...
A technique for determining trap densities as a function of energy in semiconductors is presented. Through differential capacitance measurements, trap states can be accurately measured and profiled within the bandgap as a function of energy. Measurements were carried out on samples made at the Microelectronic Research Center at Iowa State University. Hydrogen profiled nano-crystalline silicon s...
We have developed a new process to produce ultra-thin crystalline silicon films with thicknesses in the range of 0.1−1 μm on flexible substrates. A crystalline silicon wafer was cleaned by SiF4 plasma exposure and without breaking vacuum, an epitaxial film was grown from SiF4, H2 and Ar gas mixtures at low substrate temperature (Tsub ≈ 200 ◦C) in a standard RF PECVD reactor. We found that H2 di...
In this paper we investigate influence of radio frequency plasma enhanced chemical vapor deposition (RF PECVD) process parameters, which include gas flows, pressure and temperature, as well as a way of sample placement in the reactor, on optical properties and deposition rate of silicon nitride (SiNx) thin films. The influence of the process parameters has been determined using Taguchi's orthog...
We report on results of tandem amorphous/microcrystalline (a-Si:H/μc-Si:H) silicon solar cells developed in commercial Oerlikon Solar KAI PECVD reactors, at an excitation frequency of 40.68 MHz. The cell structure consists of a stack of glass/front contact/pin a-Si:H/intermediate reflector/pin μc-Si:H/back contact. LPCVD (low-pressure chemical vapor deposition) ZnO (zinc oxide) is applied as fr...
Abstract Bacterial infection of chronic wounds is a major healthcare problem that affects the quality life millions patients worldwide and leads to substantial cost burden. This project focused on manufacture potential wound healing agent. Plasma polymers from oregano secondary metabolites (PP‐OSMs) were fabricated by radiofrequency plasma‐enhanced chemical vapor deposition (RF‐PECVD) in contin...
Multi-walled carbon nanotubes (MWCNTs) have been grown on 7 nm Ni-coated substrates consisting of crystalline silicon covered with a thin layer (10 nm) of TiN, by combining hot-wire chemical vapor deposition (HWCVD) and direct current plasma-enhanced chemical vapor deposition (dc PECVD), at 620 -C. Acetylene (C2H2) gas is used as the carbon source and ammonia (NH3) and hydrogen (H2) are used ei...
Figure 1: Scanning electron microscope image close-up of the trench, electrodes, and catalyst pads. The line outlining the trench shows the extent of the wet-etch undercut. Abstract: Semi-conducting carbon nanotubes (CNT) and germanium nanowires (GNWs) are desirable fieldeffect transistor (FET) elements because of their unique electrical properties and physical stability. Previous electromechan...
The bias stability of zinc-tin-oxide ZTO thin-film transistors TFTs with either Al2O3 gate dielectrics deposited via atomic layer deposition ALD or SiO2 gate dielectrics deposited via plasma-enhanced chemical vapor deposition PECVD was compared. Both device types showed incremental mobility 11 cm2 /V s, subthreshold slopes 0.4 V /dec, and ION / IOFF ratios of 107. During repeated ID-VGS sweepin...
In this work, antiwear nanoimprint templates were made by depositing and patterning diamondlike carbon DLC films on Si and quartz. A capacitively coupled plasma enhanced chemical vapor deposition PECVD system was configured to deposit 100 nm–1 m thick DLC films on Si and quartz substrates. These films were characterized with Raman spectroscopy, electron energy loss spectroscopy, atomic force mi...
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