A.B. Mei, R.B. Wilson, D. Li, David G. Cahill, A. Rockett, Jens Birch, Lars Hultman, Joseph E Greene and Ivan Petrov, Elastic constants, Poisson ratios, and the elastic anisotropy of VN(001), (011), and (111) epitaxial layers grown by reactive magnetron sputter deposition, 2014, Journal of Applied Physics, (115), 21, 214908. http://dx.doi.org/10.1063/1.4881817 Copyright: American Institute of P...

Self-assembly of gold nanoparticles was obtained by sputter deposition on DES. SAXS and TEM investigations reveal the formation of spherical nanoparticles with a mean diameter of 5 ± 0.5 nm. For extended sputtering times, the number density of AuNPs increases linearly and a very pronounced 1st and 2nd shell ordering is observed.

The simultaneous sputter deposition of gold and silver onto ionic liquids formed bimetallic alloy nanoparticles, which exhibited composition-sensitive surface plasmon resonance, the peak wavelength being red-shifted with an increase in the surface area of the gold foil targets sputtered.

Titanium dioxide (TiO2) is one of the most widely studied photocatalysts during the past decades due to its ability to photo-oxidize harmful chemicals in both air and water to CO2 in the presence of UV light. TiO2 also shows promise for energy applications such as water splitting [1], as well as in photochemical solar cells [2]. TiO2 use has also been extended to large scale commercial producti...

J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson, High power impulse magnetron sputtering discharge, 2012, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, (30), 030801. http://dx.doi.org/10.1116/1.3691832 Copyright: American Vacuum Society, This article may be downloaded for personal use only. Any other use requires prior permission of the author and the ...

Spin-valve films of structure NiFeCo/Co/Cu/NiFeCo(Co)/FeMn/Cu were deposited on Si substrates by DC planetary magnetron sputtering techniques. The influence of base pressure, P,, on spin-valve properties was studied by varying P, over two decades from 3x10-’ to 7~10~~ Torr. The GMR ratio show a slight increase with increasing P, until a large decrease occurs at Pd3.3~1 W6 Torr. Exchange bias fi...

The growth of TiNi thin films by ion beam sputter deposition using a Kaufmann type ion source is described. Argon ions are used to sputter separate Ti and Ni targets to deposit nearequiatomic TiNi thin films. Typically, ion energies and current densities of 1500 eV and 1 mA cm respectively are used, with an argon overpressure of around 0.05 mtorr, to achieve deposition rates of order 1 μm hr. T...

Of crucial importance to the thin film process engineer is an understanding of the parameters which affect the film thickness distributions which may be obtained from magnetron sources. This paper describes how variations in source design, target erosion and source-to-substrate distance affect observed uniformities from a magnetron source. A simple method of simulating magnetron sources using t...