A new form of potential sputtering has been found for impact of slow ( < or = 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgO(x). In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering p...

Molecular Dynamics simulations are carried out for investigating atomic processes of platinum sputtering. Sputtered Pt atom energy distribution functions (EDF) are determined at different sputtering argon ionenergies: 100, 500, and 1000 eV. Calculated EDF show a cross-over from Thompson theory to binary collision model when increasing argon ion energy and Pt atom sputtered energy. Implanted arg...

We study a single queue joining equilibrium when there is uncertainty in the consumers’ minds about the service rate and value. Without such uncertainty, the joining equilibria are characterized by means of a single threshold queue length above which consumers do not join (Naor, 1969). We show that in the presence of such uncertainty, the equilibrium joining strategy is not fully characterized ...

A 127 o electrostatic coaxial cylindrical energy spectrometer with a radial position sensitive MCP detector is designed and constructed. Beyond the traditional step-by-step voltage scanning method, this spectrometer is able to measure a segment of energy spectra at a working voltage. Therefore, the experiment efficiency is notably enhanced and it is suitable for measuring the energy spectra of ...

In this work, we established a convenient while reproduceable method for stabilizer-free silver nanoparticle (AgNP)-coated micropipettes by the combination of magnetron sputtering and surface coupling agent. The clear surfaces of the AgNPs are beneficial for absorbing biological or functional molecules on their surfaces. By optimizing the operating parameters, such as sputtering current and spu...

Erosion/redeposition is examined for the sidewalls of a dissipative divertor using coupled impurity transport, charge exchange, and sputtering codes, applied to plasma solutions for the ITER design. A key issue for this regime is possible runaway self-sputtering, due to the effect of a low boundary density and nearly parallel field geometry on redeposition parameters. Net erosion rates, assumin...

Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first in...

This work focuses on control of surface roughness in sputtering processes including two surface micro-processes, diffusion and erosion. The fluctuation of surface height of such sputtering processes can be described by the stochastic Kuramoto–Sivashinsky equation (KSE), a fourth-order stochastic partial differential equation (PDE). Specifically, we consider sputtering processes, including surfa...

High power impulse magnetron sputtering (HIPIMS) of an Al target in Ar/O2 mixtures has been studied. The use of HIPIMS is shown to drastically influence the process characteristics compared to conventional sputtering. Under suitable conditions, oxide formation on the target as the reactive gas flow is increased is suppressed, and the hysteresis effect commonly observed as the gas flow is varied...

in industrial applications, most materials are exposed to wear and friction because multiple conditions are used. however, the tribological properties of these materials can be improved with different techniques. one such technique that improves the frictional property of a surface is the use of self-lubricating coatings. in this study, multicomponent coatings of nominal composition cu-ni3al-mo...