نتایج جستجو برای: force lithography
تعداد نتایج: 195635 فیلتر نتایج به سال:
by Minjun Yan Quantum-dot cellular automata (QCA) is an emerging, promising, future generation computational architecture that encodes binary information into the positions of electrons. The switching and logic function of this transistorless architecture has already been realized in metal QCA and magnetic QCA. “Bottom-up” molecular implementation may not only circumvent the lithography limits,...
Arrays of microneedles (MNAs) are integrated in an out-of-plane fashion with a base plate and can serve as patches for the release of drugs and vaccines. We used soft-lithography and micromolding to manufacture ceramic nanoporous (np)MNAs. Failure modes of ceramic npMNAs are as yet poorly understood and the question remained: is our npMNA platform technology ready for microneedle (MN) assembly ...
High-resolution lithography often involves thin resist layers which pose a challenge for pattern characterization. Direct evidence that the pattern was well-defined and can be used for device fabrication is provided if a successful pattern transfer is demonstrated. In the case of thermal scanning probe lithography (t-SPL), highest resolutions are achieved for shallow patterns. In this work, we ...
Atomic-level imperfections play an increasingly critical role in nanophotonic device performance. However, it remains challenging to accurately characterize the sidewall roughness with sub-nanometer resolution and directly correlate this A method that allows measure of waveguides made any material (including dielectrics) using high atomic force microscopy is developed. This illustrated by measu...
High resolution magnetic force microscopy of patterned L10-FePt dot arrays by nanosphere lithography
Nanoimprint lithography (NIL) is a fabrication technology that offers high-throughput, ultrahigh resolution patterning at great cost savings compared to most competing next-generation radiative lithography methods. As a result of its rapid development in the past decade and its potential for sub-100 nm lithography, NIL has been listed by MIT’s Technology Review as one of ten emerging technologi...
نمودار تعداد نتایج جستجو در هر سال
با کلیک روی نمودار نتایج را به سال انتشار فیلتر کنید