نتایج جستجو برای: ingaas

تعداد نتایج: 2410  

2009
Gehong Zeng Je-Hyeong Bahk Ashok T. Ramu John E. Bowers Hong Lu Arthur C. Gossard Zhixi Bian Mona Zebarjadi Ali Shakouri

We report the fabrication and characterization of segmented element power generator modules of 16 x 16 thermoelectric elements consisting of 0.8 mm thick Bi2Te3 and 50 μm thick ErAs:(InGaAs)1-x(InAlAs)x with 0.6% ErAs by volume. Erbium Arsenide metallic nanoparticles are incorporated to create scattering centers for middle and long wavelength phonons, and to form local potential barriers for el...

2001
T. Chung G. Walter

Data are presented showing that, besides the improvement in carrier collection, it is advantageous to locate strain-matching auxiliary InGaAs layers @quantum wells ~QWs!# within tunneling distance of a single-quantum-dot ~QD! layer of an AlGaAs–GaAs–InGaAs–InAs QD heterostructure laser to realize also smaller size QDs of greater density and uniformity. The QD density is changed from 2310/cm for...

Journal: :Microelectronics Journal 2009
Daniel A. May-Arrioja Nathan Bickel A. Alejo-Molina Miguel Torres-Cisneros José J. Sánchez-Mondragón Patrick LiKamWa

The intermixing characteristics of three widely used combinations of InP based quantum wells (QW) are investigated using the impurity-free vacancy disordering (IFVD) technique. We demonstrate that the bandgap energy shift is highly dependent on the concentration gradient of the as-grown wells and barriers, as well as the thickness of the well, with thinner wells more susceptible to interdiffusi...

Journal: :Microelectronics Journal 2004
J. Hellara F. Hassen Hichem Maaref H. Dumont V. Souliere Y. Monteil

We investigate the MOCVD growth characteristic of the In0.47Ga0.53As layers lattice matched to InP using TMAs as an alternative source of arsine. Improvement of the InGaAs quality was studied by means of PL lines, the origin of photoluminescence (PL), atomic force microscopy. Low temperature PL spectra exhibit a broad this broadening was analyzed using quantitative models for the linewidth of b...

2017
A Higuera-Rodriguez B Romeira S Birindelli L E Black E Smalbrugge P J van Veldhoven W M M Kessels M K Smit A Fiore

The III-V semiconductor InGaAs is a key material for photonics because it provides optical emission and absorption in the 1.55 μm telecommunication wavelength window. However, InGaAs suffers from pronounced nonradiative effects associated with its surface states, which affect the performance of nanophotonic devices for optical interconnects, namely nanolasers and nanodetectors. This work report...

2005
Kurt Cimino Yue-ming Hsin Milton Feng

This work reports experimental data comparing the low frequency noise spectrum of InP based HBTs. Double heterojunction device structures are examined with and without surface passivation ledges. INTRODUCTION Compound semiconductor InP heterojunction bipolar transistors (HBTs) hold great promise for ultra high-speed analog microwave circuit applications. The low frequency noise characteristics ...

1997
M. Gendry

Detailed analysis of the 1/f low-frequency noise (LFN) in In0:52Al0:48As/InGaAs MODFET structures is performed, for low drain bias (below pinch-off voltage), in order to identify the physical origin and the location of the noise sources responsible for drain current fluctuations in the frequency range 0.1 Hz–105 Hz. Experimental data were analyzed with the support of a general modeling of the 1...

2008
A. Tosi A. Dalla Mora X. Jiang

InGaAs/InP devices suitable as Single-Photon Avalanche Diodes (SPADs) for photon counting and photon timing applications in the near-infrared provide good detection efficiency and low time jitter, together with fairly low darkcount rate at moderately low temperatures. However, their performance is still severely limited by the afterpulsing effect, caused by carriers trapped into deep levels dur...

Journal: :IEEE Journal of the Electron Devices Society 2018

2009
P. D. Ye Y. Xuan Y. Q. Wu

High-performance inversion-type enhancement-mode (E-mode) nchannel MOSFETs on In-rich InGaAs using ALD Al2O3 as high-k gate dielectrics are demonstrated. The maximum drain current, peak transconductance, and the effective electron velocity of 1.0 A/mm, 0.43 S/mm and 1.0x10 cm/s at drain voltage of 2.0 V are achieved at 0.75-μm gate length devices. The device performance of In-rich InGaAs NMOSFE...

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