This paper describes a nano-scale tensile test to study the fatigue properties of LPCVD silicon nitride thin films using a novel electrostatic actuator design. Mechanical-amplifier devices made in silicon nitride thin films can apply controllable tensile stress (2.0–7.8 GPa) to test structures with relatively low actuation voltages (5.7–35.4 VRMS) at the resonant frequencies of the devices. The...

Amorphous fluoropolymer films have low dielectric constants and high chemical resistance and, so, have potential to be used as the insulator for high speed interconnects and as protection layers. Many applications would require high resolution patterning of the fluoropolymer film. We have found that these films are easily etched by reactive ion beam etching using an O2/Ar gas mixture. High etch...

Preparation of Transmission Electron Microscope (TEM) samples by Focused Ion Beam (FIB) milling is one of the most precise techniques now routinely used for example in failure analysis or material science. These TEM samples are commonly prepared using Ga FIB technology, starting more than 20 years ago [13]. Presently FIB columns are commonly combined with the Scanning Electron Microscopy (SEM) ...

Articles you may be interested in Fabrication and optical properties of controlled Ag nanostructures for plasmonic applications Formation of triplet and quadruplet plasmonic nanoarray templates by holographic lithography Appl. Sensing properties of infrared nanostructured plasmonic crystals fabricated by electron beam lithography and argon ion milling Fabrication of sub-10nm gap arrays over lar...

We present a microfluidic chip embedded with gold electrodes for digital counting of bacteria. Microfluidic chip is fabricated to detect single Escherichia coli flowing in a channel which size is comparable to the bacteria. The chip is fabricated by photolithography, dry etching, e-beam evaporation, lift-off process, and focused ion beam (FIB) milling process. We could detect the trace of the i...

We experimentally investigate surface-plasmon assisted photoemission to enhance the efficiency of metallic photocathodes for high-brightness electron sources. A nanohole array-based copper surface was designed to exhibit a plasmonic response at 800 nm, fabricated using the focused ion beam milling technique, optically characterized and tested as a photocathode in a high power radio frequency ph...

To date, nano-and micro-structuring has commonly been implemented by a combination of specifically optimized processes of electron-beam lithography and reactive ion etching, thus limiting the range of materials that can be structured to only a few. In this talk we will introduce focused ion beam (FIB) milling as an emerging technology that enables fast, reliable and well-controlled nanometer-si...

Focused ion beam milling is a processing technology which allows flexible direct writing of nanometer scale features efficiently substituting electron beam lithography. No mask need results in ability for patterns writing even on fragile micromechanical devices. In this work we studied the abilities of the tool for fabrication of diffraction grating couplers in silicon nitride waveguides. The g...

Transmission electron microscopy (TEM) is a powerful tool for the investigation of the microstructure of materials, providing crystallographic information and composition at the nanometer scale. For such studies, samples should be transparent to the electron beam. In this review, TEM sample preparation techniques for different classes of materials, such as metals and alloys, multilayered coatin...

We demonstrated GaN-based photonic crystal (PC) nanobeam cavities by using the e-beam lithography and the suspended nanobeams were realized by focused-ion beam (FIB) milling. One resonant mode was clearly observed at 411.7 nm at 77K by optical pumping. The quality factor was measured to be to 7.4 × 10(2). Moreover, the degree of polarization value was measured to be 40%. The temperature-depende...