This article describes an accurate subPico flowmeter bifurcatedin to liquid and gas flowrates less than 1mol/s for both MEMS/NEMS and cryogenic technology applications. The MEMS/NEMS are described as either two Gauges (instrument), or quartz fluctuating forks, even if the liquid or gas flows through an element, as well as cryogenic technology consisting of arrays of e...

Nano-scale patterns were produced with UV-curable acrylated hyperbranched polymer nanocomposites using nanoimprint lithography with a glass master in a rapid, low-pressure process. The pattern of the glass master was replicated with composites containing up to 25 vol% SiO2 with a shape fidelity better than 98%. Photo-rheology, interferometry and atomic force microscopy were used to analyze them...

Emerging nano-scale technologies are pushing the fabrication boundaries at their limits, for leveraging an even higher density of nano-devices towards reaching 4F(2)/cell footprint in 3D arrays. Here, we study the liftoff process limits to achieve extreme dense nanowires while ensuring preservation of thin film quality. The proposed method is optimized for attaining a multiple layer fabrication...

In this research, nano-ring light-emitting diodes (NRLEDs) with different wall width (120 nm, 80 nm and 40 nm) were fabricated by specialized nano-sphere lithography technology. Through the thinned wall, the effective bandgaps of nano-ring LEDs can be precisely tuned by reducing the strain inside the active region. Photoluminescence (PL) and time-resolved PL measurements indicated the lattice-m...

The resputtering of gold films from nano-holes defined in a sacrificial PMMA mask, which was made by electron beam lithography, was carried out with a dry plasma etching tool in order to form well-like structures with a high aspect ratio (height/width ≈ 3-4) at the rims of the nano-holes. The extraordinary transmission through the patterns of such nano-wells was investigated experimentally and ...

Compared with UV embossing and micro-contact imprinting, hot embossing technology is the first to be used in nano-imprint lithography, and is access to copying the parallel structure in micro-nano-scale at low cost and relatively faster speed. This paper explores which factors influence some pattern transferring accuracy appearing in the experiment: the adhesion between mold and polymethyl meth...

In this paper, we present the fabrication of nano optical elements by means of deep reactive ion etching technique (Bosch process) on a silicon-on-insulator substrate. The nano structures are fabricated in a two step process. The first step consists of direct-writing nanoscale patterns on PMMA polymer by electron beam lithography. These nano patterns are then transferred to the silicon surface ...

Noble metal nanoslit structure has attracted an increasing interest in nanoscale photonic devices, and bio applications. However, methods typically used for fabricating nano-sized slit, such as, e-beam direct etching, template-assisted photolithography, and nano-imprint lithography, have low yield and are limited to sub-nano sized slit. In this work, we observed that slit width of Au metal is g...

Using a low temperature process flow, a photoresist ashing technique was developed to define nano-gaps for the fabrication of electrostatically transduced RF MEMS. This was performed by shrinking laterally the photoresist to the required dimension in a O2 plasma etch system. Polycrystalline silicon-germanium (poly-SiGe) films replaced poly silicon as the structural layer, while poly germanium w...