Aluminum nitride (AlN) thin films have potential applications in microelectronic and optoelectronic devices. In this study, AlN thin films with different thicknesses were deposited on silicon substrate by single ion beam sputtering method. The X-ray diffraction (XRD) spectra revealed that the structure of films with thickness of - nm was amorphous, while the polycrystalline hexagonal AlN with a...

In this paper, the effect of magnetic field on the morphology, structure and magnetic properties of electrodeposited FeCu/Cu thin films was investigated. The films were deposited on Au2PdAg/glass substrates using electrodeposition technique in potentiostatic control. The magnetic fields of 5000 and 7000 Oe were applied on deposition bath during deposition. Two series of thin films were prepared...

nowadays, ii – iv group semiconductor thin films have attracted considerable attention from the research community because of their wide range of application in the fabrication of solar cells and other opto-electronic devices. cadmium zinc sulfide (zn-cds) thin films were grown by chemical bath deposition (cbd) technique. x-ray diffraction (xrd) is used to analyze the structure and crystallite ...

In this study various yttria doped  zirconia based thin films were prepared by the aqueous tape casting method. The rheological property of the paste was studies. The phase content and microstructure of the samples was investigated by X-ray diffraction and scanning electron microscope, respectively. The mechanical properties of thin films were studied by Vickers microhardness and nanoindentatio...

In this study, vanadium oxynitride thin films were deposited by reactive magnetron sputtering using pure targets, Ar as a plasma carrier, and mix of N2 O2 gases. Various ratios mass flow rates between two gases maintained constant during the process. To obtain crystalline phases oxynitrides, rapid thermal annealing in atmosphere at 600 °C 700 for 5 min was conducted after deposition. This study...

High-resolution transmission electron microscopy (HR-TEM) has been used as the ultimate method of thickness measurement for thin films. The appearance of phase contrast interference patterns in HR-TEM images has long been confused as the appearance of a crystal lattice by nonspecialists. Relatively easy to interpret crystal lattice images are now directly observed with the introduction of annul...

molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using dc magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°c) with flow oxygen at 200 sccm (standard cubic centimeter per minute). the crystallographic structure of the films was obtained by means of x-ray diffraction (xrd) analysis. an atomic force micr...