Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by ...

In this work, we reported the investigation of diamond-like carbon (DLC) coating on inner surface polyethylene terephthalate (PET) bottles by Microwave Plasma Enhanced Chemical Vapor Deposition to improve their barrier properties. We used 2.45 GHz microwave generate plasma, acetylene (C2H2) and argon (Ar) were as monomer gas diluted gas. The effects plasma process parameters deposition uniformi...

Particle-agglomerated films exhibit rough surfaces, which can be suitable for realization of ultra hydrophobicity. We fabricated particles and their deposits silica with organic functional groups (SiO:CH) by plasma polymerization organosilicon reactants including methyl vinyl groups. The trimethyl(vinyl)silane reactant showed a uniform deposition the plasma-polymerized SiO:CH in large area, whi...

As a media aluminum oxide (Al2O3) thin films deposited by radio frequency plasma-assisted atomic layer deposition (RF-PA-ALD) method were employed to explore the magnetic field effect. Different from normal plasma-assisted ALD (PA-ALD) technology a magnetic field was applied during the whole deposition process. With this novel ALD technology it obtains that the deposition rate in each cycle of ...

Remote plasma activated chemical vapor deposition (RPACVD) is an attractive fabrication technique owing to the increased selectivity of radical generation which can be obtained compared to deposition techniques in which the substrate is immersed in the plasma. This selectivity can be compromised if the deposition gases, which are typically injected downstream of the plasma zone, back-diffuse in...

Magnetron sputtering is a widely used physical vapor deposition technique for deposition and formation of nanocatalyst thin films and clusters. Nevertheless, so far only few studies investigated this formation process at the fundamental level. We here review atomic scale molecular dynamics simulations aimed at elucidating the nanocatalyst growth process through magnetron sputtering. We first in...