Flexible SiO 2 /HfO 1D photonic crystals and active –HfO :Er 3+ all-glass flexible planar waveguides fabricated by radio frequency sputtering, are presented. The show a strong dependence of the optical features on light incident angle: i) blue-shift stopband ii) narrowing reflectance window. Nevertheless, most interesting result is experimental evidence that, even after breakage, where glass sh...

BiVO4 films were fabricated by radio frequency (RF) sputtering from a single target. The deposited found to be rich in Bi, and the reason for Bi-richness was investigated. It inferred Monte Carlo simulation that, during sputtering, transfer process of target atoms through argon gas played major role this phenomenon. resulted an imbalanced ratio Bi V, arising difference atom mass interaction rad...

This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...

The structural and optical properties of nanocrystalline GaN and GaN:H films grown by RF-magnetron sputtering are focused here. The films were grown using a Ga target and a variety of deposition parameters (N2/H2/Arflow rates, RF power, and substrate temperatures). Si (100) and fused silica substrates were used at relatively low temperatures (Ts ≤ 420K). The main effects resulting from the depo...

This study investigates the preparation of InSb-added TiO2 nanocomposite films by RF sputtering. The optical absorption spectra are obviously shifted to visible and near-infrared regions. High-resolution transmission electron microscopy indicates that sphere-shaped InSb nanocrystals with a size of about 15 nm are dispersed in a matrix. The X-ray diffraction result reveals that the matrix forms ...

Fabrication of Micro-Electro-Mechanical-Systems (MEMS) requires deposition of films such as SiO2, Si3N4, ZnO, polysilicon, phosphosilicate glass (PSG), Al, Cr-Au, Pt, etc. for use as structural, sacrificial, piezoelectric and conducting material. Deposition of these materials at low temperature is desirable for fabricating sensors/actuators on temperature-sensitive substrates and also for integ...