نتایج جستجو برای: a capacitance

تعداد نتایج: 13434286  

Journal: :Physical chemistry chemical physics : PCCP 2014
Yuranan Hanlumyuang Xiaobao Li Pradeep Sharma

Quantum capacitance is a fundamental quantity that can directly reveal many-body interactions among electrons and is expected to play a critical role in nanoelectronics. One of the many tantalizing recent physical revelations about quantum capacitance is that it can possess a negative value, hence allowing for the possibility of enhancing the overall capacitance in some particular material syst...

2015
Justin Wong Sayeef Salahuddin Justin C. Wong Jeffrey Bokor

A thermodynamic model was constructed to analyze the negative capacitance effect in the presence of piezoelectricity. The model demonstrated that while piezoelectricity can lead to negative capacitance in principle, it is not strong enough in practice due to the unphysical amounts of charge and strain required. The inclusion of higher-order electromechanical coupling such as electrostriction ca...

Journal: :Nano letters 2014
Gang Shi Yuranan Hanlumyuang Zheng Liu Yongji Gong Weilu Gao Bo Li Junichiro Kono Jun Lou Robert Vajtai Pradeep Sharma Pulickel M Ajayan

Conventional wisdom suggests that decreasing dimensions of dielectric materials (e.g., thickness of a film) should yield increasing capacitance. However, the quantum capacitance and the so-called "dead-layer" effect often conspire to decrease the capacitance of extremely small nanostructures, which is in sharp contrast to what is expected from classical electrostatics. Very recently, first-prin...

Journal: :Proceedings of the IEEE 2019

2008
Chun-Yu Lin Ming-Dou Ker

To mitigate the radio-frequency (RF) performance degradation caused by electrostatic discharge (ESD) protection device, low capacitance (low-C) design on ESD protection device is a solution. With the smaller layout area and small parasitic capacitance under the same ESD robustness, silicon-controlled rectifier (SCR) device has been used as an effective on-chip ESD protection device in RF ICs. I...

2000
C. Sudhama Oana Spulber Colin McAndrew Rainer Thoma

Bulk and novel MOSFET structures with gate-lengths in the 30nm regime are expected to become industry standards in ~2007. As devices are scaled down to these lengths, overlapand fringe-capacitance between the gate and source/drain regions gain more importance as a fraction of the total gate-capacitance. Therefore in numerical simulations of these structures it is necessary to carefully include ...

2008
Nihar R. Mohapatra Madhav P. Desai

The potential impact of high permittivity gate dielectrics on device short channel and circuit performance is studied over a wide range of dielectric permittivities ( gate) using two-dimensional (2-D) device and Monte Carlo simulations. The gate-to-channel capacitance and parasitic fringe capacitances are extracted using a highly accurate three-dimensional (3-D) capacitance extractor. It is obs...

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