This paper presents a technique to pattern materials in deep holes and/or on non-planar sub,clinic surfaces. A rather old technique, namely, electron-beam evaporation of metals through a shadow mask, is used. The realization of high-resolutian shadow masks using mieromachining techniques is described. Further, a low ohmic electrical wafer fred-through with a small parasitic capacitance to the s...

Abstract The possibilities of plasma-chemical refining metallurgical silicon have been demonstrated. It is shown that by electron-beam it possible to reduce the concentration phosphorus and boron, as well main metallic impurities evaporation both these their volatile compounds.

Niobium thin film wires were fabricated using electron beam lithography with a four layer liftoff mask system, and subsequently thinned by anodisation. The resistance along the wire was monitored in situ and trimmed by controlling the anodisation voltage. Depending on the room temperature sheet resistance, samples showed either superconducting or insulating behaviour at low temperatures. A Coul...

The properties of canonical and microcanonical ensembles of a black hole with thermal radiation and the problem of black hole evaporation in 3-D are studied. In 3-D Einstein-anti-de Sitter gravity we have two relevant mass scales, mc = 1/G, and mp = (h̄ Λ/G)1/3, which are particularly relevant for the evaporation problem. It is argued that in the ‘weak coupling’ regime Λ < (h̄G)−2, the end point ...

Y-shaped ZnO nanobelts are fabricated by a simple thermal evaporation method. Transmission Electron Microscopy (TEM) investigation shows that these ZnO nanobelts are crystals with twinned planes {11-21}. Convergent Beam Electron Diffraction studies show that the two sides of twinned nanobelts are O-terminated towards the twinned boundary and Zn-terminated outwards. The two branches of twinned Z...

CdTe thin films with 2.8 µm thickness were deposited by electron beam evaporation method. X-ray diffraction, scanning electron microscopy, UV-Vis-NIR spectroscopy and atomic force microscopy (AFM) were used to characterize the films. The results of AFM analysis revealed that the CdTe films have uniform surface. CdTe thin films were heat-treated by SnCl2 solution. Structural analysis using XRD s...

We report here the epitaxial growth of III-nitride material on freestanding HfO2 gratings by molecular beam epitaxy. Freestanding HfO2 gratings are fabricated by combining film evaporation, electron beam lithography, and fast atom beam etching of an HfO2 film by a front-side silicon process. The 60-μm long HfO2 grating beam can sustain the stress change during the epitaxial growth of a III-nitr...

We report a new metallization process for achieving low resistance ohmic contacts to molecular beam epitaxy grown n-GaN (--Or7 cme3) using an Ah% bilayer metallization scheme. Four different thin-film contact metallizations were compared during the investigation, including Au, Al, Ti/Au, and Ti/Al layers. The metals were first deposited via conventional electron-beam evaporation onto the GaN su...

An electron beam resist is typically applied by spin-coating, which cannot be reliably applied on nonplanar, irregular, or fragile substrates. Here we demonstrate that the popular negative electron beam resist polystyrene can be coated by thermal evaporation. A high resolution of 30 nm half-pitch was achieved using the evaporated resist. As a proof of concept of patterning on irregular surfaces...