X-ray based metrology techniques have demonstrated their capabilities for the measurement of critical process parameters on complex microelectronic thin film structures such as layer crystallinity or texture analysis (X-ray Diffraction, XRD), multilayer thickness (X-ray Reflectivity, XRR), material composition (X-ray Fluorescence, XRF) [1]. Achieving the X-ray beam spatial resolution and photon...

TiO2 nanorods are synthesized by a thermal corrosion. In present work, synthesis of TiO2 nanorods in anatase, rutile and Ti8O15 phases, by using the sol-gel method and alkaline corrosion are reported. The morphologies and crystal structures of TiO2 nanorods are characterized by use of field emission scanning electron microscopy, atomic force microscopy and X-ray diffractometer techniques. The o...

Copper films of 300 nm thickness deposited by planar magnetron sputtering on glass substrates, for substrate temperatures between 300 and 500 K, and deposition rate of 10 ?s?1. Microstructure of these films was obtained by X-ray diffraction, while the texture mode of diffractometer was used for stress measurement by the sin2? technique. The components of the stress tensor are obtained using mea...

tio2 nanorods are synthesized by a thermal corrosion. in present work, synthesis of tio2 nanorods in anatase, rutile and ti8o15 phases, by using the sol-gel method and alkaline corrosion are reported. the morphologies and crystal structures of tio2 nanorods are characterized by use of field emission scanning electron microscopy, atomic force microscopy and x-ray diffractometer techniques. the o...

copper films of 300 nm thickness deposited by planar magnetron sputtering on glass substrates, for substrate temperatures between 300 and 500 k, and deposition rate of 10 ?s?1. microstructure of these films was obtained by x-ray diffraction, while the texture mode of diffractometer was used for stress measurement by the sin2? technique. the components of the stress tensor are obtained using mea...