In this paper we present a physical layout methodology, called dRail, to allow power gated and non-power gated cells to be placed next to each other. This is unlike traditional voltage area layout which separates cells to prevent shorting of power supplies leading to impact on area, routing and power. To implement dRail, a modified standard cell architecture and physical layout is proposed. The...

Digital CMOS Integrated Circuits (ICs) suffer from serious layout features printability issues associated to the lithography manufacturing process. Regular layout designs are emerging as alternative solutions to reduce these ICs systematic subwavelength lithography failures. However, there is no metric to evaluate and compare the layout regularity of those regular designs. In this paper we prop...

sheet metal components design and manufacture need a great deal of experience and know-how. strip layout design is usually done with trial and error until best design for strip layout is finally achieved. knowledge for the system is formulated from plasticity theories, experimental results, and the empirical knowledge of field experts. in this paper, an algorithm which can automatically design ...

In sub-wavelength lithography, light field Alt-PSM (Alternating Phase Shifting Mask) is an essential technology for poly layer printability. In a standard cell based design, the problem of obtaining Alt-PSM compliance for an individual cell layout has been solved well [3]. However, placing Alt-PSM compliant cells together can not guarantee Alt-PSM compliance of the entire chip/block layout due ...

Both the quality of the results of TEX s formula layout algorithm and the complexity of its description in the TEXbook are hard to beat The algorithm is verbally described as an imperative program with very complex control ow and complicated manipulations of the data structures representing formulae In a forthcoming textbook we describe TEX s formula layout algorithm as a functional program tra...

A fuzzy goal programming-based approach is used to solve a proposed multi-objective linear programming model and simultaneously handle two important problems in cellular manufacturing systems, viz. cell formation and layout design. Considerations of intra-cell layout, the intra-cell material handling can be calculated exactly. The advantages of the proposed model are considering machining cost,...

In advanced technology nodes, unidirectional layout is strongly preferred for high-density metal layers for better manufacturability. The lithography printing of unidirectional layout can be tightly controlled with illumination source optimization and resolution enhancement techniques. Meanwhile, with the unidirectional layout, self-aligned double and quadruple patterning can be applied to achi...

A high-mix, make-to-order production system can become inefficient when non-value added operations consume too much time, space or labour. To address these issues, cell re-layout is conducted and a CONWIP system is proposed. The cell re-layout started with data collection on current layout, product mix and routings, then the current layout was modified to develop several alternatives, and final...