Silicon nanoparticles are converted into multimetallic silicide by using molten salts as liquid reaction media under dynamic vacuum. They deliver highly efficient electrocatalysts for alkaline water oxidation.

Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films Zhefeng Li, Roy G. Gordon,* Huazhi Li, Deo V. Shenai, and Christian Lavoie Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138, USA Dow Electronic Materials, North Andover, Massachusetts 01845, USA IBM, Thomas J. Watson Research Center, Yorktown He...

In this article, we report the synthesis of single-crystalline nickel silicide nanowires (NWs) via chemical vapor deposition method using NiCl2·6H2O as a single-source precursor. Various morphologies of δ-Ni2Si NWs were successfully acquired by controlling the growth conditions. The growth mechanism of the δ-Ni2Si NWs was thoroughly discussed and identified with microscopy studies. Field emissi...

Silicon quantum dots obtained by the reaction of magnesium silicide with ethylenediamine dihydrochloride were utilized to investigate the sensing mechanism and sensitivity for DMNB detection applications. Sensing DMNB provided us with evidence that Si QDs with a higher lying conduction band have better sensitivity compared to CdSe QDs.

We have investigated the nanostructure and microstructure resulting from ns laser irradiation simultaneous with deposition of Co films on Si(001) substrates. The spatial order and length scales of the resulting nanopatterns and their crystalline microstructure were investigated as a function of film thickness h and laser energy density E using a combination of atomic force, scanning electron an...

The formation of a single phase is an important requirement for high-entropy ceramics (HECs) because precipitation unwanted phases generally degrades their functional properties. This paper provides useful guideline the single-phase HECs. First, metal elements constituting HECs can be divided into two groups: that have parent as stable and with same stoichiometry but different crystal structure...

We investigated the temporal evolution of nickel-silicide phase-formation and the simultaneous redistribution of platinum during silicidation of a 10 nm thick Ni0.95Pt0.05 film on a Si(100) substrate. Grazing incidence x-ray diffraction (GIXRD) and atom-probe tomography (APT) measurements were performed on as-deposited films and after rapid thermal annealing (RTA) at 320 or 420 C for different ...

We characterize composition and structure of ultrathin nickel silicide during formation from 3 nm Ni films on Si(1 0 0) using in-situ high-resolution ion scattering transmission electron microscopy. show the transition to occur in discrete steps, which an intermediate phase is observed within a narrow range temperature 230 °C 290 °C. The film this found be 50% Ni:50% Si, without evidence for lo...