the effect of temperature variation on the growth of carbon nanotubes (cnts) using thermal chemical vapor deposition (tcvd) is presented. nickel and cobalt (ni-co) thin films on silicon (si) substrates were used as catalysts in tcvd technique. acetylene gas was used in cnts growth process at the controlled temperature ranges from 850-1000 ̊ c. catalysts and cnts characterization was carried out ...

CHARACTERIZATION AND CORROSION OF BCC-TANTALUM COATING DEPOSITED ON ALUMINUM AND STEEL SUBSTRATE BY DC MAGNETRON SPUTTERING by Chirag Joshi Tantalum is one of the most versatile highly refractory corrosion-resistant metals. Tantalum coating can be used as an effective corrosion barrier if it is continuous, free from defects and it adheres well to the substrate. A DC magnetron sputtering techniq...

copper thin films with nano-scale structure have numerous applications in modern technology.  in this work, cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by dc magnetron sputtering technique at room temperature in pure ar gas. the sputtering time was considered in 4, 8, 12 and 16 min, respectively. the thickness effect on the structural, morpholo...

Microstructural features of sputtered chromium and chromium-50 wt. % platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf-sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size ofless than 10...

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

We have studied the easy-axis reorientation of Ni/Pd multilayer with varying Ar sputtering pressure. All the Ni/Pd multilayers prepared by dc-magnetron sputtering at an Ar sputtering pressure of 2 mTorr show in-plane magnetic anisotropy. However, room-temperature perpendicular magnetic anisotropy was observed in Ni/Pd multilayers prepared at an Ar sputtering pressure of 7 mTorr. To understand t...

Coating growth and mechanical properties of nanolamellar Cr2AlC coatings at various sputtering power were investigated in the present study. Cr2AlC coating was deposited on the IN 718 superalloy and (100) Si wafers by DC magnetron sputtering at different sputtering powers. The structure and properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmis...

The use of pulsed dc-sputtering sources for reactive magnetron sputtering with oxygen offers a possibility to suppress the negative effects target poisoning (such as arcing). This results in wide process range selection desired operating point. control plays major role maintaining constant coating properties and affects stoichiometry coating, well rate economic impact process. In hysteresis, du...