Plasma impedance probes (PIPs) are a type of RF probe that primarily measures electron density. This work introduces two advancements: streamlined analytical model for interpreting PIP-monopole measurements and techniques achieving ≥1 MHz time-resolved PIP measurements. The model’s improvements include introducing sheath thickness as measurement providing more accurate method measuring density ...

Numerical simulations and experimental measurements were combined to determine the ability of a PIP to measure plasma density and electron collision frequency in a plasma containing spatial gradients as well as time-varying oscillations in the plasma density. Collision frequency was to be measured by the width of the parallel resonance in the real part of plasma impedance-vs.-frequency, while p...

To investigate the electrical changes observed at plasma etching endpoints, experiments were performed in an inductively coupled, rf-biased reactor, during CF4/Ar plasma etches of silicon dioxide films on silicon substrates. The rf bias current, voltage, and impedance were measured vs. time during etching. Simultaneously, a Langmuir probe measured the electron and ion densities, ion current den...

scanning impedance microscopy (sim) is one of the novel scanning probe microscopy (spm) techniques, which has been developed to taking image from sample surface, providing quantitative information with high lateral resolution on the interface capacitance, and investigating the local capacitance–voltage (c–v) behavior of the interface and ac transport properties. the sim is an ordinary afm equip...

This paper presents the analysis of the impedance of a short dipole antenna in a cold plasma using a quasi-static approach. Two radically different current distributions on the antenna are considered and their influences on the antenna impedance are studied. These distributions include a one-dimensional (1-D) triangular distribution and a three-dimensional (3-D) exponential current distribution...

In two-probe impedance measurements the interfacial impedance between metal electrode and ionic conductor contributes to the measured impedance. Therefore a calculation procedure which separates the bulk from the interfacial impedance must be applied. The separation procedure can be avoided by measuring the bulk conductivity in the four-probe arrangement. The impedance of polycrystalline sample...