نتایج جستجو برای: chemical deposition

تعداد نتایج: 454324  

Journal: :Chemical communications 2015
Al-Monsur Jiaul Haque Jihye Kim Gorachand Dutta Sinyoung Kim Haesik Yang

This communication reports a novel enzymatic Ag-deposition scheme combined with chemical-chemical redox cycling by reduced β-nicotinamide adenine dinucleotide. This novel scheme allows a higher Ag-deposition rate than a scheme using only enzymatic Ag deposition. Therefore, it can be applied for the highly sensitive detection of a cardiac biomarker, creatine kinase-MB.

Journal: :IEEE Trans. on CAD of Integrated Circuits and Systems 1999
Wolfgang Pyka Peter Fleischmann Bernhard Haindl Siegfried Selberherr

For wafer sizes in state-of-the-art semiconductor manufacturing ranging up to 300 mm, the uniformity of processes across the wafer becomes a very important issue. We present a fully three-dimensional model for the feature scale simulation of continuum transport and reaction determined high-pressure chemical vapor deposition processes suitable for the investigation of such nonuniformities. The n...

2009
R. I. Badran F. S. Al-Hazmi S. Al-Heniti A. A. Al-Ghamdi J. Li S. Xiong

Two sets of hydrogenated microcrystalline silicon thin-film samples were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique at different deposition conditions of excited power and pressure. The correlation between the crystalline volume fraction for the samples determined from Raman spectra and the excited power, pressure, absorption coefficient, refractive index and optica...

1998
A. P. Burden S. R. P. Silva

The simultaneous generation of dust during the deposition of semiconducting thin films by radio frequency plasma enhanced chemical vapor deposition has so far been regarded as a troublesome by-product. However, we present results from recent microstructural investigations of carbonaceous dust particles from a methane precursor that demonstrate that the technique may be suited to generating full...

2004
H He

When prepared by conventional evaporation or sputtering, thin films of amorphous silicon contain a large concentration of defects and microvoids.3,4 These give rise to localized states in the energy gap of the material.3,4 Plasma-enhanced chemical vapor deposition (PECVD), using silicon hydrides, significantly reduces the number of defects and thereby lowers the concentration of localized state...

2017
Pitsiri Sukkaew

................................................................................................. iii Sammanfattning ..................................................................................... iv Acknowledgement ................................................................................... v List of included publications ..............................................................

2009
Negin Shahshahan Raymond A. Adomaitis Sheryl Ehrman Panagiotis Dimitrakopoulos

Title of thesis: A SIMPLIFIED MODEL OF PLANETARY CHEMICAL VAPOR DEPOSITION REACTORS Negin Shahshahan, Master of Science, 2009 Directed by: Professor Raymond A. Adomaitis Department of Chemical and Biomolecular Engineering A simplified model for planetary chemical vapor deposition reactors is proposed and used to compute deposition species mole fraction and deposition rate in the reactor depleti...

پایان نامه :وزارت علوم، تحقیقات و فناوری - دانشگاه پیام نور استان مازندران - دانشکده علوم پایه 1391

پژوهشگران بسیاری در خصوص نانو بلورک های نیکلی و اکسید نیکلی کار کرده اند که دلیل انتخاب آن به کاربردهای آن ها در قطعه های الکتریکی، خازن ها، حسگرها، مواد مغناطیسی، کامپوزیت ها، کاتالیزور ها و تهیه ی فلز مناسب بر می گردد. در کار حاضر تلاشی شده است تا به کمک روش ساده ی سل – ژل که یک روش از پایین به بالا است و حتی در دمای اتاق قابلیت به کارگیری دارد نانو ذره های نیکلی و اکسید نیکلی را سنتز کنیم. د...

Journal: :Mugla Journal of Science and Technology 2020

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