نتایج جستجو برای: deposition

تعداد نتایج: 92632  

رضا ثابت داریانی , , صبا خدیویان آذر, ,

In this simulation model, oblique angle deposition method and Monte Carlo random walks have been used. Growth model was ballistic deposition (BD). Incident particles flux comes to substrate at an angle with respect to normal. Two physical factors including self-shadowing and mobility limitation of incident particles make structures similar to independent columns with different shapes and separa...

M. Ghorbani and A.M. Saedi,

Nanowire is a cylindrical nano-structure with nanometer dimensions. In this research, the studied nanowire was made from the magnetic triple Ni-Fe-Co alloy. We utilized ordered porous anodic aluminum oxide as a template for the nanowire deposition. The nanowire arrays were electrodeposited in the cylindrical pores of the oxide layer by AC potential in a simple sulfate bath. Then the relation ...

2004
J. A. Popma

Introduction Silicon oxynitride is a flexible material for use as planar optical waveguides because by changing the composition ( O N ratio) the refractive index can be tuned from 1.46 to 2.0'. Several methods can be used for deposition: PECVD, LPCVD and sputtering. The advantages of PECVD are easy control of composition, high deposition rate and low stress. A disadvantage is the high hydrogen ...

2010
Chee Huei Lee Ming Xie Vijaya Kayastha Jiesheng Wang Yoke Khin Yap

For the first time, patterned growth of boron nitride nanotubes is achieved by catalytic chemical vapor deposition (CCVD) at 1200 C using MgO, Ni, or Fe as the catalysts, and an Al2O3 diffusion barrier as underlayer. The as-grown BNNTs are clean, vertically aligned, and have high crystallinity. Near band-edge absorption ∼6.0 eV is detected, without significant sub-band absorption centers. Elect...

1999
R. PLATZ S. WIEDER A. SHAH S. WAGNER

A comparative study of DC, RF and VHF excitation for the plasma enhanced chemical vapor deposition (PECVD) of intrinsic layers of a-Si:H is presented, with special emphasis on the effects of hydrogen dilution. Growth rates at comparable plasma power, for substrate temperatures between 100°C and 300°C and for various H2 dilution ratios are presented, along with optical bandgap, H content, and el...

2014
H. Zheng E. T. Ryan J. L. Shohet Y. Nishi

Articles you may be interested in Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass J. Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition Plasma...

2009
Robert Sturm

In the study presented here a stochastic model predicting the deposition of variably shaped asbestos fibers in the human respiratory tract is introduced. Deposition calculations are commonly based on the concept of the aerodynamic diameter. Besides Brownian diffusion, inertial impaction, and sedimentation, also interception representing the capture of particles at the carinal ridges of single a...

2016
Mitsuoki Hishida Takeyuki Sekimoto Mitsuhiro Matsumoto Akira Terakawa Alessio Bosio

Stopping the plasma-enhanced chemical vapor deposition (PECVD) once and maintaining the film in a vacuum for 30 s were performed. This was done several times during the formation of a film of i-layer microcrystalline silicon (μc-Si:H) used in thin-film silicon tandem solar cells. This process aimed to reduce defect regions which occur due to collision with neighboring grains as the film becomes...

2016
Marcela Bilek

Jamesh, M., Boxman, R., Bilek, M., Kocer, C., Hu, T., Zhang, X., McKenzie, D., Chu, P. (2016). Effects of pulse voltage and deposition time on the adhesion strength of graded metal/carbon films deposited on bendable stainless steel foils by hybrid cathodic arc Glow discharge plasma assisted chemical vapor deposition. Applied Surface Science, 366, 535-544. <a href="http://dx.doi.org/10.1016/j.ap...

2004
Francisco Hernández Jorge Rodríguez Albert Romano Rodríguez Anna Vilà Juan Ramón Morante

Since the last years, Focused Ion Beam (FIB) has been growing in popularity as a microand nanofabrication tool, especially because it has shown exceptional capabilities and very high precision in both milling and depositing materials at the nanometer scale. Being a sputtering (physical) process, milling by FIB can be realized over a wide variety of materials. On the contrary, deposition involve...

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