An introduction to lithography methods and providing a practical method for its optimization
نویسندگان
چکیده
In the first part of present article, important and main methods photolithography are reviewed discussed. Then we introduce ways to improve images created on photoresist, which is material lithography. Lithography with high-energy particle soft lithography then described. second part, contact-photolithography method its improvement process, use in our laboratory, introduced described detail. We used this for make diffraction optical elements a glass substrate, doped by silver nanoparticles, using helium ion beam. Light from masks prevents access very small images. To reduce influence quality produced elements, adapted optimized contact-lithography project. Our solution, presented practical available other researchers Iran
منابع مشابه
An Introduction to Lithography
VLSI devices consist of highly complicated and dense circuit patterns. Lithography is the process by which the circuit patterns are transferred on to the semiconductor wafer, and current techniques can offer resolutions of around 100nm. However, as demand increases for smaller devices, the resolution offered by current techniques will not be satisfactory. We will look at current techniques, the...
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ژورنال
عنوان ژورنال: Iranian Journal of Physics Research
سال: 2022
ISSN: ['2345-3664', '1682-6957']
DOI: https://doi.org/10.47176/ijpr.22.1.31218