Controlling the optical properties of hafnium dioxide thin films deposited with electron cyclotron resonance ion beam deposition

Comparative study of IR and UV laser damage resistance of silica thin films deposited by Electron Beam deposition, Ion Plating, Ion Assisted Deposition and Dual Ion Beam Sputtering

The laser damage resistance of optical coatings is a critical point for a large number of applications. However improving this resistance is often hard to obtain because of the large number of parameters in the deposition processes than can modify the laser damage threshold and the lack of detailed and exploitable studies published on this subject. Then, the aim of this work is to test and anal...

Laser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering

The laser damage resistance of optical coatings is a key point for a large number of applications. The aim of this work is to test and analyze the laser damage resistance of a thin film material commonly used for high power applications (SiO2) and deposited with different techniques: Electron Beam Deposition, Ion Assisted Deposition, Low Voltage Reactive Ion Plating and Dual Ion Beam Sputtering...

Characterization of CrBN films deposited by ion beam assisted deposition

of CrBN films deposited by ion beam assisted deposition" (2002). This article reports on the growth and analysis of CrBN nanocrystalline materials using an ion beam assisted deposition process. In addition, this article addresses the utilization of spectroscopic ellipsometry for in situ analysis of ternary nitrides. Coatings, with a total thickness of 1.5 Ϯ0.2 ␮m, were deposited at low temperat...

Optical and structural properties of SiOxNyHz films deposited by electron cyclotron resonance and their correlation with composition

Structure and optical properties of nanocrystalline hafnium oxide thin films

Hafnium oxide (HfO2) films were grown by sputter-deposition by varying deposition temperature (Ts) in a wide range of 25–700 C. The deposited HfO2 films were characterized by studying their growth behavior, microstructure, and optical properties. Characterization of the films employing a wide range of analytical techniques indicate a clear functional relationship between processing conditions, ...