Crystalline Structure, Morphology, and Adherence of Thick TiO2 Films Grown on 304 and 316L Stainless Steels by Atomic Layer Deposition

Titanium dioxide (TiO2) thin films are widely used in transparent optoelectronic devices due to their excellent properties, as well photocatalysis, cosmetics, and many other biomedical applications. In this work, TiO2 were deposited onto AISI 304 316L stainless steel substrates by atomic layer deposition, followed comparative evaluation of the mixture anatase rutile phase X-ray diffraction, Raman maps, morphology SEM-FEG-AFM, adhesion on two substrates, aiming evaluate scratch resistance. spectroscopy mapping diffraction with Rietveld refinement showed that composed phases, different percentages. Scratch testing using a diamond tip film was employed adherence determine friction coefficient, results showing satisfactory both substrates.