Development of a spatially controllable chemical vapor deposition reactor with combinatorial processing capabilities
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چکیده
منابع مشابه
Development of a spatially controllable chemical vapor deposition reactor with combinatorial processing capabilities
Most conventional chemical vapor deposition sCVDd systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address these limitations, a novel CVD reactor system has been developed that can explicitly control the spatial pr...
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Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...
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ژورنال
عنوان ژورنال: Review of Scientific Instruments
سال: 2005
ISSN: 0034-6748,1089-7623
DOI: 10.1063/1.1906183