Development of Abrasive-Free Copper CMP Process
نویسندگان
چکیده
منابع مشابه
Copper CMP and Process Control
A production worthy, copper CMP technology has been successfully developed on a multi-platen CMP system. The System consists of three polish platens, each of which is equipped with an optical endpoint detection system. The process consists of three steps with different polish slurries, and is designed to polish copper with a tantalum based barrier, and to achieve good defect performance. Patter...
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Since first published in 1998, the Enterprise JavaBeans technology has become a popular choice for the development of middleware systems. Even though its popularity, the technology is considered quite complex and rather difficult to master. The main contribution to its complexity is the part of the EJB that deals with persistence. The most common and most popular way of implementing EJB persist...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 2009
ISSN: 1882-675X,0912-0289
DOI: 10.2493/jjspe.75.496