Development of double-sided microstructured Si(Li) detectors
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چکیده
منابع مشابه
Development of Double-Sided Microstructured Si(Li) Detectors
A new technique for manufacturing double-sided structured Si(Li) detectors has been established. The position-sensitive structure on the implanted p–contact can be made smaller than 100 m by photolithography followed by plasma etching of grooves to separate the position elements. By modifying this technique position-sensitive structures on a thin ( 30 m) Li-diffused contact were created. Areas ...
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ژورنال
عنوان ژورنال: IEEE Transactions on Nuclear Science
سال: 2002
ISSN: 0018-9499,1558-1578
DOI: 10.1109/tns.2002.801541