Experimental Drift Velocity Field in Transistor Devices
نویسندگان
چکیده
منابع مشابه
Simulation and optimization of GaN-based metal-oxide-semiconductor high-electron-mobility-transistor using field-dependent drift velocity model
Undoped GaN-based metal-oxide-semiconductor high-electron-mobility-transistors MOS-HEMTs with atomic-layer-deposited Al2O3 gate dielectrics are fabricated with gate lengths from 1 μm up to 40 μm. With a two-dimensional numerical simulator, we report simulation results of the GaN-based MOS-HEMTs using field-dependent drift velocity model. A developed model, taking into account polarization-induc...
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ژورنال
عنوان ژورنال: Acta Physica Polonica A
سال: 2020
ISSN: 1898-794X,0587-4246
DOI: 10.12693/aphyspola.138.554