Fabrication of Germanium-on-insulator in a Ge wafer with a crystalline Ge top layer and buried GeO2 layer by oxygen ion implantation
نویسندگان
چکیده
منابع مشابه
Self-interstitials injection in crystalline Ge induced by GeO2 nanoclusters
G. G. Scapellato,1 S. Boninelli,1 E. Napolitani,2 E. Bruno,1 A. J. Smith,3 S. Mirabella,1 M. Mastromatteo,2 D. De Salvador,2 R. Gwilliam,3 C. Spinella,4 A. Carnera,2 and F. Priolo1 1MATIS IMM-CNR and Dipartimento di Fisica e Astronomia, Università di Catania, via S. Sofia 64, 95123 Catania, Italy 2MATIS IMM-CNR and Dipartimento di Fisica, Università di Padova, via Marzolo 8, 35131 Padova, Italy...
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ژورنال
عنوان ژورنال: Materials Science and Engineering: B
سال: 2020
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2020.114616