Full-wafer mapping and response surface modeling techniques for thin film deposition processes
نویسندگان
چکیده
منابع مشابه
Full Wafer Mapping and Response Surface Modeling Techniques for thin Film Deposition Processes
Computational techniques for representing and analyzing full wafer metrology data are developed for chemical vapor deposition and other thin-film processing applications. Spatially resolved measurement data are used to produce “virtual wafers” that are subsequently used to create response surface models for predicting the full-wafer thickness, composition, or any other property profile as a fun...
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ژورنال
عنوان ژورنال: Journal of Crystal Growth
سال: 2009
ISSN: 0022-0248
DOI: 10.1016/j.jcrysgro.2009.02.032